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- W2770294718 abstract "Low dimensional copper wires have gained a lot of interest in the field of device fabrication due to their interesting properties, low synthesis cost and many potential applications. In the present work, effects of γ-radiation exposure on physico-chemical and electrical properties of Cu microwires fabricated by electrochemical deposition in the track-etch membrane were studied. The synthesized Cu microwires were exposed using γ-radiation from a 60Co source at four different doses of 30, 80, 130 and 180 kGy respectively. The morphology of the pristine and γ-radiation exposed Cu microwires were characterized using Scanning Electron Microscopy. The X-ray diffraction spectra results confirmed the face centered cubic crystal structure for pristine and γ-radiation exposed microwires. Microwire crystallite size was determined using the Scherrer equation and found to increase from 39 to 50 nm with increase in gamma doses. The I-V measurements indicated that the resistance of the microwires increased with increasing gamma dose, suggesting that exposure to γ-radiation increases the reflection from the grain boundaries and induces defects and oxygen impurities in the wires that hinder the mobility of the electrons resulting into decrease in conductivity." @default.
- W2770294718 created "2017-12-04" @default.
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- W2770294718 date "2018-02-01" @default.
- W2770294718 modified "2023-10-18" @default.
- W2770294718 title "Gamma ray induced modifications in copper microwires synthesized using track-etched membrane" @default.
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- W2770294718 doi "https://doi.org/10.1016/j.vacuum.2017.11.031" @default.
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