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• W2774725781 abstract "We report on ultra-wide bandgap (UWBG) Al <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>0.7</sub> Ga <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>0.3</sub> N channel metal-oxide-semiconductor field-effect transistors (MOSFETs) grown by metal-organic chemical vapor deposition. Employing reverse Al composition graded ohmic contact layers and 20 nm Al <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> O <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>3</sub> gate-dielectric, 250 nm thick Al <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>0.7</sub> Ga <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>0.3</sub> N:Si channel MOSFETs resulted in the maximum current density of 0.5 A/mm, which is the highest value reported for AlGaN channels with Al composition >0.25. Transistors with a gate-drain spacing (L <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>GD</sub> of 1.7μm demonstrated a breakdown voltage (V <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>DG</sub> ) of ~620 V, translating in an average lateral breakdown field of ~3.6 MV/cm. This work establishes UWBG AlGaN as a promising candidate for advanced RF applications." @default.
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• W2774725781 date "2018-02-01" @default.
• W2774725781 modified "2023-10-18" @default.
• W2774725781 title "High Al-Content AlGaN Transistor With 0.5 A/mm Current Density and Lateral Breakdown Field Exceeding 3.6 MV/cm" @default.
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• W2774725781 doi "https://doi.org/10.1109/led.2017.2780221" @default.
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