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• W2783192751 endingPage "8123" @default.
• W2783192751 startingPage "8117" @default.
• W2783192751 abstract "Photolithography based on optical mask is widely used in academic research laboratories due to its low cost, simple mechanism, and ability to pattern in micron-sized features on a wafer-scale area. Because the resolution is bound by diffraction limits of the light source, nanoscale patterning using photolithography requires short-wavelength light source combined with sophisticated optical elements, adding complexity and cost. In this paper, a novel method of subwavelength patterning process using conventional i-line mercury lamp is introduced, without the use of such advanced optical tools. The method utilizes the re-entrant geometry of image reversal photoresist produced from the developing process, where a secondary mask is generated by isotropically depositing a metal layer to cover the re-entrant profile of the photoresist. Removing the photoresist by applying ultrasonic vibrations in acetone bath uniformly cracks the metal layer at the sidewalls of the re-entrant profile, exposing the substrate with a reduced feature size. The width of the initial mask pattern can be reduced by 400 nm in a controlled manner, regardless of the original width choice. As a result, the method is shown to achieve sub-100 nm scale linear patterns compatible for both subsequent deposition process and dry-etching process. Our approach is applicable to various shapes of the patterns and can be used in electronic device fabrication requiring nanoscale lithography patterning, such as the gate fabrication of AlGaN/GaN high-electron-mobility transistor." @default.
• W2783192751 created "2018-01-26" @default.
• W2783192751 creator A5000104615 @default.
• W2783192751 creator A5012965478 @default.
• W2783192751 creator A5013193808 @default.
• W2783192751 creator A5046686883 @default.
• W2783192751 creator A5068260313 @default.
• W2783192751 date "2018-01-18" @default.
• W2783192751 modified "2023-09-26" @default.
• W2783192751 title "Photolithography-Based Nanopatterning Using Re-entrant Photoresist Profile" @default.
• W2783192751 cites W1501261314 @default.
• W2783192751 cites W1971705391 @default.
• W2783192751 cites W1972056349 @default.
• W2783192751 cites W1995654037 @default.
• W2783192751 cites W2001209413 @default.
• W2783192751 cites W2008427617 @default.
• W2783192751 cites W2018586229 @default.
• W2783192751 cites W2020045825 @default.
• W2783192751 cites W2033192228 @default.
• W2783192751 cites W2058566450 @default.
• W2783192751 cites W2062047511 @default.
• W2783192751 cites W2073245411 @default.
• W2783192751 cites W2078463351 @default.
• W2783192751 cites W2083358145 @default.
• W2783192751 cites W2085078750 @default.
• W2783192751 cites W2085091215 @default.
• W2783192751 cites W2102586241 @default.
• W2783192751 cites W2129996279 @default.
• W2783192751 cites W2141981815 @default.
• W2783192751 cites W2151703212 @default.
• W2783192751 cites W2617353793 @default.
• W2783192751 cites W4230749418 @default.
• W2783192751 doi "https://doi.org/10.1021/acsami.7b17628" @default.
• W2783192751 hasPubMedId "https://pubmed.ncbi.nlm.nih.gov/29345131" @default.
• W2783192751 hasPublicationYear "2018" @default.
• W2783192751 type Work @default.
• W2783192751 sameAs 2783192751 @default.
• W2783192751 citedByCount "7" @default.
• W2783192751 countsByYear W27831927512019 @default.
• W2783192751 countsByYear W27831927512020 @default.
• W2783192751 countsByYear W27831927512021 @default.
• W2783192751 countsByYear W27831927512022 @default.
• W2783192751 crossrefType "journal-article" @default.
• W2783192751 hasAuthorship W2783192751A5000104615 @default.
• W2783192751 hasAuthorship W2783192751A5012965478 @default.
• W2783192751 hasAuthorship W2783192751A5013193808 @default.
• W2783192751 hasAuthorship W2783192751A5046686883 @default.
• W2783192751 hasAuthorship W2783192751A5068260313 @default.
• W2783192751 hasConcept C100460472 @default.
• W2783192751 hasConcept C105487726 @default.
• W2783192751 hasConcept C120665830 @default.
• W2783192751 hasConcept C121332964 @default.
• W2783192751 hasConcept C1291036 @default.
• W2783192751 hasConcept C134406635 @default.
• W2783192751 hasConcept C136525101 @default.
• W2783192751 hasConcept C142724271 @default.
• W2783192751 hasConcept C160671074 @default.
• W2783192751 hasConcept C171250308 @default.
• W2783192751 hasConcept C192562407 @default.
• W2783192751 hasConcept C204223013 @default.
• W2783192751 hasConcept C204787440 @default.
• W2783192751 hasConcept C2776326872 @default.
• W2783192751 hasConcept C2779227376 @default.
• W2783192751 hasConcept C49040817 @default.
• W2783192751 hasConcept C53524968 @default.
• W2783192751 hasConcept C71924100 @default.
• W2783192751 hasConceptScore W2783192751C100460472 @default.
• W2783192751 hasConceptScore W2783192751C105487726 @default.
• W2783192751 hasConceptScore W2783192751C120665830 @default.
• W2783192751 hasConceptScore W2783192751C121332964 @default.
• W2783192751 hasConceptScore W2783192751C1291036 @default.
• W2783192751 hasConceptScore W2783192751C134406635 @default.
• W2783192751 hasConceptScore W2783192751C136525101 @default.
• W2783192751 hasConceptScore W2783192751C142724271 @default.
• W2783192751 hasConceptScore W2783192751C160671074 @default.
• W2783192751 hasConceptScore W2783192751C171250308 @default.
• W2783192751 hasConceptScore W2783192751C192562407 @default.
• W2783192751 hasConceptScore W2783192751C204223013 @default.
• W2783192751 hasConceptScore W2783192751C204787440 @default.
• W2783192751 hasConceptScore W2783192751C2776326872 @default.
• W2783192751 hasConceptScore W2783192751C2779227376 @default.
• W2783192751 hasConceptScore W2783192751C49040817 @default.
• W2783192751 hasConceptScore W2783192751C53524968 @default.
• W2783192751 hasConceptScore W2783192751C71924100 @default.
• W2783192751 hasFunder F4320338279 @default.
• W2783192751 hasIssue "9" @default.
• W2783192751 hasLocation W27831927511 @default.
• W2783192751 hasLocation W27831927512 @default.
• W2783192751 hasOpenAccess W2783192751 @default.
• W2783192751 hasPrimaryLocation W27831927511 @default.
• W2783192751 hasRelatedWork W1538884143 @default.
• W2783192751 hasRelatedWork W1966895858 @default.
• W2783192751 hasRelatedWork W1985330728 @default.
• W2783192751 hasRelatedWork W1993151199 @default.
• W2783192751 hasRelatedWork W2015083230 @default.
• W2783192751 hasRelatedWork W2024271717 @default.
• W2783192751 hasRelatedWork W2066278812 @default.
• W2783192751 hasRelatedWork W2150695081 @default.

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