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• W2783233401 endingPage "045007" @default.
• W2783233401 startingPage "045007" @default.
• W2783233401 abstract "A technique is presented for determination of the depletion of the etchant, etched depth, and instantaneous etch rate for Si etching with XeF2 in a pulsed etching system in real time. The only experimental data required is the pressure data collected temporally. Coupling the pressure data with the knowledge of the chemical reactions allows for the determination of the etching parameters of interest. Using this technique, it is revealed that pulsed etching processes are nonlinear, with the initial etch rate being the highest and monotonically decreasing as the etchant is depleted. With the pulsed etching system introduced in this paper, the highest instantaneous etch rate of silicon was recorded to be 19.5 µm min−1 for an initial pressure of 1.2 Torr for XeF2. Additionally, the same data is used to determine the rate constant for the reaction of XeF2 with Si; the reaction is determined to be second order in nature. The effect of varying the exposed surface area of Si as well as the effect that pressure has on the instantaneous etch rate as a function of time is shown applying the same technique. As a proof of concept, an AlN resonator is released using XeF2 pulses to remove a sacrificial poly-Si layer." @default.
• W2783233401 created "2018-01-26" @default.
• W2783233401 creator A5001352767 @default.
• W2783233401 creator A5005197667 @default.
• W2783233401 creator A5027278149 @default.
• W2783233401 creator A5046297648 @default.
• W2783233401 creator A5052242417 @default.
• W2783233401 creator A5053103871 @default.
• W2783233401 creator A5054229369 @default.
• W2783233401 creator A5059145214 @default.
• W2783233401 creator A5073660580 @default.
• W2783233401 creator A5083137817 @default.
• W2783233401 date "2018-02-15" @default.
• W2783233401 modified "2023-09-27" @default.
• W2783233401 title "Determination of etching parameters for pulsed XeF2etching of silicon using chamber pressure data" @default.
• W2783233401 cites W1513538672 @default.
• W2783233401 cites W1632626184 @default.
• W2783233401 cites W1810012726 @default.
• W2783233401 cites W1965148421 @default.
• W2783233401 cites W1968184839 @default.
• W2783233401 cites W1973685322 @default.
• W2783233401 cites W1975419227 @default.
• W2783233401 cites W1976323788 @default.
• W2783233401 cites W1983433740 @default.
• W2783233401 cites W1984304153 @default.
• W2783233401 cites W2008267986 @default.
• W2783233401 cites W2018797807 @default.
• W2783233401 cites W2019601235 @default.
• W2783233401 cites W2036220518 @default.
• W2783233401 cites W2037239912 @default.
• W2783233401 cites W2038678064 @default.
• W2783233401 cites W2042574896 @default.
• W2783233401 cites W2044924796 @default.
• W2783233401 cites W2056333685 @default.
• W2783233401 cites W2057319117 @default.
• W2783233401 cites W2078388681 @default.
• W2783233401 cites W2110070104 @default.
• W2783233401 cites W2118795295 @default.
• W2783233401 cites W2122209110 @default.
• W2783233401 cites W2132904005 @default.
• W2783233401 cites W2134655731 @default.
• W2783233401 cites W2144327728 @default.
• W2783233401 cites W2149757820 @default.
• W2783233401 cites W2167699618 @default.
• W2783233401 cites W2488028742 @default.
• W2783233401 cites W2537642778 @default.
• W2783233401 cites W2573784202 @default.
• W2783233401 cites W40892031 @default.
• W2783233401 doi "https://doi.org/10.1088/1361-6439/aaa74e" @default.
• W2783233401 hasPublicationYear "2018" @default.
• W2783233401 type Work @default.
• W2783233401 sameAs 2783233401 @default.
• W2783233401 citedByCount "4" @default.
• W2783233401 countsByYear W27832334012019 @default.
• W2783233401 countsByYear W27832334012020 @default.
• W2783233401 countsByYear W27832334012022 @default.
• W2783233401 crossrefType "journal-article" @default.
• W2783233401 hasAuthorship W2783233401A5001352767 @default.
• W2783233401 hasAuthorship W2783233401A5005197667 @default.
• W2783233401 hasAuthorship W2783233401A5027278149 @default.
• W2783233401 hasAuthorship W2783233401A5046297648 @default.
• W2783233401 hasAuthorship W2783233401A5052242417 @default.
• W2783233401 hasAuthorship W2783233401A5053103871 @default.
• W2783233401 hasAuthorship W2783233401A5054229369 @default.
• W2783233401 hasAuthorship W2783233401A5059145214 @default.
• W2783233401 hasAuthorship W2783233401A5073660580 @default.
• W2783233401 hasAuthorship W2783233401A5083137817 @default.
• W2783233401 hasConcept C100460472 @default.
• W2783233401 hasConcept C113196181 @default.
• W2783233401 hasConcept C121285527 @default.
• W2783233401 hasConcept C121332964 @default.
• W2783233401 hasConcept C130472188 @default.
• W2783233401 hasConcept C171250308 @default.
• W2783233401 hasConcept C185592680 @default.
• W2783233401 hasConcept C191897082 @default.
• W2783233401 hasConcept C192562407 @default.
• W2783233401 hasConcept C2777859621 @default.
• W2783233401 hasConcept C2779227376 @default.
• W2783233401 hasConcept C30646810 @default.
• W2783233401 hasConcept C33220542 @default.
• W2783233401 hasConcept C43617362 @default.
• W2783233401 hasConcept C49040817 @default.
• W2783233401 hasConcept C544956773 @default.
• W2783233401 hasConcept C97355855 @default.
• W2783233401 hasConceptScore W2783233401C100460472 @default.
• W2783233401 hasConceptScore W2783233401C113196181 @default.
• W2783233401 hasConceptScore W2783233401C121285527 @default.
• W2783233401 hasConceptScore W2783233401C121332964 @default.
• W2783233401 hasConceptScore W2783233401C130472188 @default.
• W2783233401 hasConceptScore W2783233401C171250308 @default.
• W2783233401 hasConceptScore W2783233401C185592680 @default.
• W2783233401 hasConceptScore W2783233401C191897082 @default.
• W2783233401 hasConceptScore W2783233401C192562407 @default.
• W2783233401 hasConceptScore W2783233401C2777859621 @default.
• W2783233401 hasConceptScore W2783233401C2779227376 @default.
• W2783233401 hasConceptScore W2783233401C30646810 @default.
• W2783233401 hasConceptScore W2783233401C33220542 @default.
• W2783233401 hasConceptScore W2783233401C43617362 @default.

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