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- W2783343769 abstract "The growth mechanism of Ti(C,N) coatings produced by chemical vapor deposition was investigated as a function of the TiCl4/CH3CN molar ratio in excess of H2. The depositions were carried out at a total pressure of 8 kPa, using single crystalline (0 0 l) α-Al2O3 substrates. The Ti(C,N) coatings were characterized by X–ray diffraction, X-ray photoelectron spectroscopy and scanning electron microscopy. The investigated coatings were between 6 and 13 µm thick. The reaction orders of TiCl4 and CH3CN were determined to 0 and 1, respectively, showing that CH3CN is the rate-determining reactant. The preferred orientation of the deposited Ti(C,N) was investigated, showing that molar ratios TiCl4/CH3CN higher than 2.5 lead to 〈2 1 1〉/〈3 1 1〉 oriented coatings. A formation mechanism for the 〈2 1 1〉/〈3 1 1〉 orientations is suggested. Such high ratios lead to the formation of Ti {1 1 1} twinning planes, which provide surface sites that can facilitate fast dissociation of the strong cyanide bond, and thereby cause faster growth in the 〈2 1 1〉/〈3 1 1〉 directions. Coatings deposited at lower molar ratios show a pronounced 〈1 1 1〉 out-of-plane orientation, characterized by a {1 1 1} rocking curve yielding values for full width at half maximum (FWHM) below 0.5°." @default.
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- W2783343769 date "2019-02-01" @default.
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- W2783343769 title "Texture formation in chemical vapor deposition of Ti(C,N)" @default.
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- W2783343769 doi "https://doi.org/10.1016/j.jcrysgro.2018.12.030" @default.
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