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• W2789299064 abstract "Lithography-based Additive Manufacturing Technologies (L-AMT) exploit the curing of photosensitive materials upon light exposure. We developed a hybrid exposure concept. This system is able to overcome the challenge of providing good surface qualities and excellent feature resolution as well as a throughput similar to dynamic mask-based L-AMT systems by combining two light sources. A Digital Light Processing (DLP®) Light Engine (LE) with a building area of 144 x 90 mm² offers a pixelsize of 56 μm. In order to further improve the achievable resolution, a continuous laser-exposed contour line (spot size 20 μm) on the outside of the projected envelope can be written with an additional scanning laser-system. The matching of the DLP® projection mask and the laser-contour is crucial for accurate printing. Therefore a calibration tool was developed, which facilitates the alignment of the two light sources. A dichroic coated mirror enables a perpendicular alignment of the DLP® light beam and the laser beam." @default.
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• W2789299064 date "2018-05-01" @default.
• W2789299064 modified "2023-09-25" @default.
• W2789299064 title "A hybrid exposure concept for lithography-based additive manufacturing" @default.
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• W2789299064 doi "https://doi.org/10.1016/j.addma.2018.03.024" @default.
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