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- W2794162023 abstract "Abstract An e-beam exposure can be applied to charging of dielectrics. In SiO2 this phenomenon is investigated fundamentally, but nobody use the charged dielectric layer as substrate for controllable CVD. In the present work it is shown that the growth of graphene-like films (transparent conductive continuous films which possess a high value from applied viewpoint) can be controlled by e-beam irradiating the substrate surface with various exposure doses. The quality and the thickness of GLF on SiO2/Si increase together with preliminary exposure dose. The mechanism of the observed effect is discussed. Quasi-3D structures with different thicknesses of GLFs are grown during a single synthesis." @default.
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- W2794162023 date "2018-04-01" @default.
- W2794162023 modified "2023-09-24" @default.
- W2794162023 title "The control of graphene-like film CVD on pre-exposed substrate by varying an e-beam exposure dose" @default.
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- W2794162023 doi "https://doi.org/10.1016/j.matlet.2018.01.130" @default.
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