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- W2802313382 abstract "Spatioselective functionalization of silicon nanowires was achieved without using a masking material. The designed process combines metal-assisted chemical etching (MACE) to fabricate silicon nanowires and hydrosilylation to form molecular monolayers. After MACE, a monolayer was formed on the exposed nanowire surfaces. A second MACE step was expected to elongate the nanowires, thus creating two different segments. When monolayers of 1-undecene or 1-tetradecyne were formed on the upper segment, however, the second MACE step did not extend the nanowires. In contrast, nanowires functionalized with 1,8-nonadiyne were elongated, but at an approximately 8 times slower etching rate. The elongation resulted in a contrast difference in high-resolution scanning electron microscopy (HR-SEM) images, which indicated the formation of nanowires that were covered with a monolayer only at the top parts. Click chemistry was successfully used for secondary functionalization of the monolayer with azide-functionalized nanoparticles. The spatioselective presence of 1,8-nonadiyne gave a threefold higher particle density on the upper segment functionalized with 1,8-nonadiyne than on the lower segment without monolayer. These results indicate the successful spatioselective functionalization of silicon nanowires fabricated by MACE." @default.
- W2802313382 created "2018-05-17" @default.
- W2802313382 creator A5058911597 @default.
- W2802313382 creator A5059965487 @default.
- W2802313382 date "2018-05-29" @default.
- W2802313382 modified "2023-10-16" @default.
- W2802313382 title "Maskless Spatioselective Functionalization of Silicon Nanowires" @default.
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- W2802313382 doi "https://doi.org/10.1002/cnma.201800072" @default.
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