Matches in SemOpenAlex for { <https://semopenalex.org/work/W2806170654> ?p ?o ?g. }
Showing items 1 to 95 of
95
with 100 items per page.
- W2806170654 abstract "Current EUV exposure systems employ a numerical aperture (NA) of 0.33. This relatively small NA is a consequence of geometrical design limitations of all reflective projection systems with a 4 demagnification in the orthogonal x- and y-directions of the image plane. Anamorphic imaging, which employs different demagnification in horizontal (y) and vertical (x) direction can increase the NA to a value of 0.55. The consequences of using anamorphic high-NA imaging system have to be studied by rigorous methods. Since the range of illumination angles of the anamorphic system is different in x and y directions, one way to understand the involved phenomena, is to investigate and compare the impact of illumination angles for both the high-NA 4 8 anamorphic system at 0.55NA and the lower-NA 4 4 system at 0.33NA. We employ fully coherent that is single source point illumination and imaging to study the impact of the illumination direction on the most relevant lithographic metrics. These metrics include the resulting feature size or critical dimension (CD), the feature position, a local contrast or the normalized image log slope (NILS) and the best-focus position of the projected images. In this study, aerial images from a uniformly-distributed grid of 230 illumination positions were computed and analyzed. The results of the simulation study confirmed that larger illumination angles cause more pronounced shadowing effects and significant variations of the position and feature size versus the illumination direction. The larger demagnification direction of the anamorphic system involves a smaller object-side angular spread of the illumination direction, resulting in less pronounced variation of CD and position versus the illumination direction compared to the isomorphic system. Both systems exhibit a drop of the NILS for more oblique angles. However, the larger image side angles of the high-NA system result in more pronounced polarization effects, which reduce the NILS values compared to that of the lower NA system. The high NA achieved by anamorphic imaging increases the importance of 3D mask effects in EUV lithography. It is not a priori known, which of these 3D mask effects can be attributed to the absorber or the multilayer part of the mask. A hybrid mask simulation approach addresses this question. In the second part of this study, simulations using an hybrid of real and ideal mask elements were performed in an attempt to understand their individual effects of the mask elements and which mask element contributes to which of the observed effects." @default.
- W2806170654 created "2018-06-13" @default.
- W2806170654 creator A5006030999 @default.
- W2806170654 creator A5010126078 @default.
- W2806170654 creator A5010534505 @default.
- W2806170654 creator A5043309240 @default.
- W2806170654 creator A5073523730 @default.
- W2806170654 creator A5083240643 @default.
- W2806170654 date "2018-05-29" @default.
- W2806170654 modified "2023-09-23" @default.
- W2806170654 title "Simulation study of illumination effects in high-NA EUV lithography" @default.
- W2806170654 cites W2613306844 @default.
- W2806170654 cites W643454364 @default.
- W2806170654 doi "https://doi.org/10.1117/12.2315091" @default.
- W2806170654 hasPublicationYear "2018" @default.
- W2806170654 type Work @default.
- W2806170654 sameAs 2806170654 @default.
- W2806170654 citedByCount "1" @default.
- W2806170654 countsByYear W28061706542019 @default.
- W2806170654 crossrefType "proceedings-article" @default.
- W2806170654 hasAuthorship W2806170654A5006030999 @default.
- W2806170654 hasAuthorship W2806170654A5010126078 @default.
- W2806170654 hasAuthorship W2806170654A5010534505 @default.
- W2806170654 hasAuthorship W2806170654A5043309240 @default.
- W2806170654 hasAuthorship W2806170654A5073523730 @default.
- W2806170654 hasAuthorship W2806170654A5083240643 @default.
- W2806170654 hasConcept C10138342 @default.
- W2806170654 hasConcept C11413529 @default.
- W2806170654 hasConcept C115961682 @default.
- W2806170654 hasConcept C120515352 @default.
- W2806170654 hasConcept C120665830 @default.
- W2806170654 hasConcept C121332964 @default.
- W2806170654 hasConcept C138885662 @default.
- W2806170654 hasConcept C154945302 @default.
- W2806170654 hasConcept C159108749 @default.
- W2806170654 hasConcept C162324750 @default.
- W2806170654 hasConcept C162996421 @default.
- W2806170654 hasConcept C192562407 @default.
- W2806170654 hasConcept C198082294 @default.
- W2806170654 hasConcept C204223013 @default.
- W2806170654 hasConcept C24890656 @default.
- W2806170654 hasConcept C2776401178 @default.
- W2806170654 hasConcept C41008148 @default.
- W2806170654 hasConcept C41895202 @default.
- W2806170654 hasConcept C57493831 @default.
- W2806170654 hasConcept C6260449 @default.
- W2806170654 hasConcept C78336883 @default.
- W2806170654 hasConceptScore W2806170654C10138342 @default.
- W2806170654 hasConceptScore W2806170654C11413529 @default.
- W2806170654 hasConceptScore W2806170654C115961682 @default.
- W2806170654 hasConceptScore W2806170654C120515352 @default.
- W2806170654 hasConceptScore W2806170654C120665830 @default.
- W2806170654 hasConceptScore W2806170654C121332964 @default.
- W2806170654 hasConceptScore W2806170654C138885662 @default.
- W2806170654 hasConceptScore W2806170654C154945302 @default.
- W2806170654 hasConceptScore W2806170654C159108749 @default.
- W2806170654 hasConceptScore W2806170654C162324750 @default.
- W2806170654 hasConceptScore W2806170654C162996421 @default.
- W2806170654 hasConceptScore W2806170654C192562407 @default.
- W2806170654 hasConceptScore W2806170654C198082294 @default.
- W2806170654 hasConceptScore W2806170654C204223013 @default.
- W2806170654 hasConceptScore W2806170654C24890656 @default.
- W2806170654 hasConceptScore W2806170654C2776401178 @default.
- W2806170654 hasConceptScore W2806170654C41008148 @default.
- W2806170654 hasConceptScore W2806170654C41895202 @default.
- W2806170654 hasConceptScore W2806170654C57493831 @default.
- W2806170654 hasConceptScore W2806170654C6260449 @default.
- W2806170654 hasConceptScore W2806170654C78336883 @default.
- W2806170654 hasLocation W28061706541 @default.
- W2806170654 hasOpenAccess W2806170654 @default.
- W2806170654 hasPrimaryLocation W28061706541 @default.
- W2806170654 hasRelatedWork W1969886006 @default.
- W2806170654 hasRelatedWork W1972638130 @default.
- W2806170654 hasRelatedWork W1977182455 @default.
- W2806170654 hasRelatedWork W1980327336 @default.
- W2806170654 hasRelatedWork W1989253067 @default.
- W2806170654 hasRelatedWork W1994878016 @default.
- W2806170654 hasRelatedWork W2023413804 @default.
- W2806170654 hasRelatedWork W2023453658 @default.
- W2806170654 hasRelatedWork W2023543647 @default.
- W2806170654 hasRelatedWork W2036962038 @default.
- W2806170654 hasRelatedWork W2053107467 @default.
- W2806170654 hasRelatedWork W2055777098 @default.
- W2806170654 hasRelatedWork W2078593329 @default.
- W2806170654 hasRelatedWork W2130510704 @default.
- W2806170654 hasRelatedWork W2219641440 @default.
- W2806170654 hasRelatedWork W2477538146 @default.
- W2806170654 hasRelatedWork W2180194963 @default.
- W2806170654 hasRelatedWork W2471536252 @default.
- W2806170654 hasRelatedWork W2782455940 @default.
- W2806170654 hasRelatedWork W3139652984 @default.
- W2806170654 isParatext "false" @default.
- W2806170654 isRetracted "false" @default.
- W2806170654 magId "2806170654" @default.
- W2806170654 workType "article" @default.