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• W2808047291 abstract "We introduce a novel nanofabrication technique to directly deposit catalyst pads for the chemical vapor deposition synthesis of single-walled carbon nanotubes (SWCNTs) at any desired position on a substrate by Gallium focused ion beam (FIB) induced deposition of silicon oxide thin films from the metalorganic Tetraethyl orthosilicate (TEOS) precursor. A high resolution in the positioning of the SWCNTs is naturally achieved as the imaging and deposition by FIB are conducted concurrently in situ at the same selected point on the substrate. This technique has substantial advantages over the current state-of-the-art methods that are based on complex and multistep lithography processes." @default.
• W2808047291 created "2018-06-21" @default.
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• W2808047291 date "2018-07-12" @default.
• W2808047291 modified "2023-09-26" @default.
• W2808047291 title "Lithography-free control of the position of single-walled carbon nanotubes on a substrate by focused ion beam induced deposition of catalyst and chemical vapor deposition" @default.
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• W2808047291 doi "https://doi.org/10.7567/apex.11.085101" @default.
• W2808047291 hasPublicationYear "2018" @default.
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