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• W2808199616 abstract "Airborne molecular contamination (AMC) is a significant contributor to the loss of yield in semiconductor processes [1-4]. Impact of weak acids has only been considered for process technologies of 22 nm and below [5-8]. One such weak acid is nitrous acid (HNO <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> or HONO), which has no demonstrated direct impact on processes or equipment, but has nevertheless been a target for removal by AMC filtration. HNO <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> is commonly formed on all surfaces in all environments from NO <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> gas, one of the main oxides of nitrogen formed from combustion processes and ambient air photochemistry. This study investigated the behavior of the NO <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>X</sub> /HNOx system around typical AMC filter adsorbents. We find that NO gas passes through AMC filters unchanged, whereas NO <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> is converted mostly to NO, but also to HNO <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> at the low ppb level, increasing AMC load downstream of filters. Various adsorbents can capture HNO <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> , but filter lifetimes are short due to the release of the volatile compound over time. The recommendation is to critically evaluate the impact of HNO <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> on processes and equipment and adjust AMC filtration needs accordingly." @default.
• W2808199616 created "2018-06-21" @default.
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• W2808199616 date "2018-04-01" @default.
• W2808199616 modified "2023-09-27" @default.
• W2808199616 title "Airborne molecular contamination: Formation, impact, measurement and removal of nitrous acid (HNO<inf>2</inf>)" @default.
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• W2808199616 doi "https://doi.org/10.1109/asmc.2018.8373195" @default.
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