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- W2808665355 abstract "Active screen plasma nitriding (ASPN) is a relatively recent and promising technique for the enhancement of surface properties of steel and other metal alloys. The ASPN system is usually powered by a pulsed DC power supply. Therefore, the plasma parameters in an ASPN should be measured as a function of time. In this work, the measurement of time resolved plasma parameters in such system has been demonstrated using a Triple Langmuir probe (TLP) diagnostic. The TLP technique allows quick calculation of fundamental plasma parameters such as the floating potential and electron temperature [Te]. The influence of input pulse current and frequency have been studied in a low pressure H2-N2 mixture plasma generated by 40-60 kHz pulsed D.C. power supply. The plasma parameters have been correlated with the input voltage and current. The preliminary work reveals the changes in the discharge characteristics as a function of input current and thus it’s influence on time resolved plasma parameters." @default.
- W2808665355 created "2018-06-21" @default.
- W2808665355 creator A5007390718 @default.
- W2808665355 date "2018-01-01" @default.
- W2808665355 modified "2023-09-23" @default.
- W2808665355 title "Measurement of time-resolved plasma parameters in an active screen plasma nitriding system" @default.
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- W2808665355 doi "https://doi.org/10.1063/1.5042403" @default.
- W2808665355 hasPublicationYear "2018" @default.
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