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- W2809658547 abstract "The time-averaged plasma potential in a partially ionized plasma is directly linked to the electron temperature (Te). Plasmas with low Te or plasma potential are attractive for applications that require low ion energy at surfaces. This article describes a radio-frequency (RF) driven low Te plasma source. This source utilizes two RF supplies at 2 and 60 MHz to achieve the optimum plasma density and ion energy. The plasma source is divided into two regions separated by a perforated plate, which is metallic and grounded. A high density (>1017 m−3) plasma is generated in the primary region next to the RF powered electrode. The DC bias on the powered electrode is high (∼2000 V) leading to energetic ion bombardment on it. These ions produce secondary electrons that, under the low pressure condition under consideration, enter the plasma as a beam of energetic electrons and many of them reach the perforated plate. It is demonstrated that the slits in the perforated plate can be designed to prevent the RF primary plasma from leaking into the secondary region while still allowing the beam electrons to pass through. The plasma produced by the beam electrons has moderate density (∼1016 m−3) and Te < 0.5 eV. The influence of slit dimensions on the characteristics of the plasma in the secondary discharge region is examined in this article." @default.
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- W2809658547 date "2018-07-05" @default.
- W2809658547 modified "2023-09-26" @default.
- W2809658547 title "Model of a radio-frequency low electron temperature plasma source" @default.
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- W2809658547 doi "https://doi.org/10.1088/1361-6595/aacd6b" @default.
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