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- W2885167934 endingPage "57" @default.
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- W2885167934 abstract "TiO2 is well known for its photocatalytic properties and wide range of applications. However, the efficiency of amorphous TiO2 as photocatalyst is low and deposition of crystal TiO2 phases is strict to deposition parameters. The TiO2 phase dependence on temperature, total pressure (ptot) and oxygen partial pressure and total pressure (pO2/ptot [%]) ratio and how this affect growth rate has been studied in this work, TiO2 thin films were deposited via magnetron sputtering technique using different deposition parameters in order to get TiO2 either pure anatase or rutile phase. Crystallographic structure and morphology of deposited thin films were analyzed by XRD and SEM/EDS. TiO2 phase strongly depends on substrate temperature during the deposition of thin films, total pressure and pO2/ptot ratio. Analysis shows that TiO2 anatase phase depends more on substrate temperature than pO2/ptot, while TiO2 rutile phase in reverse, noting that it has better stability at high temperatures compared to anatase." @default.
- W2885167934 created "2018-08-22" @default.
- W2885167934 creator A5036239241 @default.
- W2885167934 creator A5037736698 @default.
- W2885167934 creator A5040034919 @default.
- W2885167934 creator A5089228271 @default.
- W2885167934 date "2018-08-19" @default.
- W2885167934 modified "2023-10-01" @default.
- W2885167934 title "Influence of Deposition Parameters on the Structure of TiO2 Thin Films Prepared by Reactive Magnetron Sputtering Technique" @default.
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- W2885167934 doi "https://doi.org/10.1007/978-3-319-99834-3_7" @default.
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