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- W2887794590 abstract "We analyze the threshold voltage (Vt) and switching time (ST) variations of negative capacitance UTB SOI MOSFETs (NC-SOI) and UTB SOI MOSFETs considering line-edge roughness (LER) and work function variation (WFV). Compared to SOI, NC-SOI exhibits smaller LER induced Vt variations (σVt}) and comparable WFV induced Vt variations. LER induced σVt} can be suppressed by negative capacitance, while WFV induced σVt} cannot be suppressed by negative capacitance. For considering LER, NC-SOI with larger subthreshold swing (SS) and worse short channel effect exhibits better capacitance matching, larger voltage gain (Av), and larger threshold voltage difference (Vt NC-SOI -Vt SOI ), which mitigates the σVt}. For NC-SOI MOSFETs, WFV induced σVt} (=16.2mV) is larger than LER induced σVt} (=3.8mV). For SOI MOSFETs, WFV and LER show comparable σVt}. However, for both NC-SOI and SOI MOSFETs, LER induced ST variations are larger than the WFV induced ST variations. This is because transition charge (Δ Q}) and effective drive current (Ieff) are positively correlated for considering WFV and negatively correlated for considering LER. Compared with SOI, NC-SOI considering LER and WFV exhibits smaller ST variations due to larger Ieff." @default.
- W2887794590 created "2018-08-22" @default.
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- W2887794590 date "2018-03-01" @default.
- W2887794590 modified "2023-09-25" @default.
- W2887794590 title "Analysis of Negative Capacitance UTB SOI MOSFETs considering Line-Edge Roughness and Work Function Variation" @default.
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- W2887794590 doi "https://doi.org/10.1109/edtm.2018.8421472" @default.
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