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- W2890154532 abstract "In this work, high performance anti-reflective coating (ARC) is achieved using plasma enhanced chemical vapor deposition (PECVD) on the flexible substrate at 100°C, which is the lowest growth temperature reported so far. PECVD is used to deposit double-layer ARC (DLARC) of SiOx and SiNx (wavelengths between 600 nm and 700 nm) on nylon-6. Optical parameters of different deposited layers are controlled by varying gas flow ratio, growth temperature, and chamber pressure. It has been observed that the bare nylon-6 has a reflection of about 4% itself, and with the DLARC the reflection of light is reduced by about 50%." @default.
- W2890154532 created "2018-09-27" @default.
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- W2890154532 date "2018-07-01" @default.
- W2890154532 modified "2023-09-26" @default.
- W2890154532 title "Anti-Reflective Coating for Flexible Devices Using Plasma Enhanced Chemical Vapor Deposition Technique" @default.
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- W2890154532 doi "https://doi.org/10.1109/omn.2018.8454529" @default.
- W2890154532 hasPublicationYear "2018" @default.
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