FRINK Linked Data Fragments server

Matches in SemOpenAlex for { <https://semopenalex.org/work/W2890877785> ?p ?o ?g. }

• W2890877785 endingPage "495301" @default.
• W2890877785 startingPage "495301" @default.
• W2890877785 abstract "A simulation study of focused ion beam (FIB) sputtering in SiO2 is presented. The basis of this study is an enhanced version of the EnvizION Monte Carlo simulation program for FIB processing, which previously was restricted to targets composed of a single atom. A Monte Carlo method is presented for the simulation of FIB sputtering in SiO2 in three-dimensions, with ion implantation, to elucidate the complex dynamics of nanoscale milling of compound targets. This method is applied to the simulation of sputtering experiments using both Ne+ and Ga+ ion beams. We compare simulations using experimentally derived 'measured' beam profiles for each ion species, and 'effective' beam profiles which are chosen to reproduce experimental results. Simulations using the 'measured' beam profiles produce vias which are narrower than experiments, while the 'effective' beam profiles for both Ne+ and Ga+ are significantly wider than the 'measured' profiles. The difference between the 'measured' and 'effective' beam profiles is attributed to widening of the milling effects of the beam beyond its static dimensions, due to platform level artifacts such as vibrations and, possibly, charging. Simulations using the 'effective' beam profiles are found to accurately reproduce the depths and overall shape of experimental FIB sputtered vias in test cases, which vary in ion species, beam energy, total dose, and raster parameters. This comparison is the most extensive validation of the EnvizION simulation against experiments to date. However, the location of implanted ions in simulations is shallower than experiments, which is attributed to the fact that implanted species are required to find nearest neighbor vacancies and not allowed to occupy interstitial positions." @default.
• W2890877785 created "2018-09-27" @default.
• W2890877785 creator A5008825803 @default.
• W2890877785 creator A5018231776 @default.
• W2890877785 creator A5061416325 @default.
• W2890877785 creator A5079065300 @default.
• W2890877785 creator A5089203351 @default.
• W2890877785 date "2018-10-05" @default.
• W2890877785 modified "2023-09-27" @default.
• W2890877785 title "Simulating advanced focused ion beam nanomachining: a quantitative comparison of simulation and experimental results" @default.
• W2890877785 cites W1983365479 @default.
• W2890877785 cites W2004092216 @default.
• W2890877785 cites W2004664593 @default.
• W2890877785 cites W2023875491 @default.
• W2890877785 cites W2024172140 @default.
• W2890877785 cites W2027658025 @default.
• W2890877785 cites W2033879671 @default.
• W2890877785 cites W2036690229 @default.
• W2890877785 cites W2053667303 @default.
• W2890877785 cites W2055608915 @default.
• W2890877785 cites W2069641213 @default.
• W2890877785 cites W2073001845 @default.
• W2890877785 cites W2084525137 @default.
• W2890877785 cites W2087866922 @default.
• W2890877785 cites W2093056416 @default.
• W2890877785 cites W2117397806 @default.
• W2890877785 cites W2164943497 @default.
• W2890877785 cites W2267948239 @default.
• W2890877785 cites W2528346774 @default.
• W2890877785 cites W2591100991 @default.
• W2890877785 cites W2734419237 @default.
• W2890877785 cites W2737253676 @default.
• W2890877785 cites W2771276361 @default.
• W2890877785 cites W2793006764 @default.
• W2890877785 doi "https://doi.org/10.1088/1361-6528/aae183" @default.
• W2890877785 hasPubMedId "https://pubmed.ncbi.nlm.nih.gov/30215615" @default.
• W2890877785 hasPublicationYear "2018" @default.
• W2890877785 type Work @default.
• W2890877785 sameAs 2890877785 @default.
• W2890877785 citedByCount "15" @default.
• W2890877785 countsByYear W28908777852019 @default.
• W2890877785 countsByYear W28908777852020 @default.
• W2890877785 countsByYear W28908777852021 @default.
• W2890877785 countsByYear W28908777852022 @default.
• W2890877785 countsByYear W28908777852023 @default.
• W2890877785 crossrefType "journal-article" @default.
• W2890877785 hasAuthorship W2890877785A5008825803 @default.
• W2890877785 hasAuthorship W2890877785A5018231776 @default.
• W2890877785 hasAuthorship W2890877785A5061416325 @default.
• W2890877785 hasAuthorship W2890877785A5079065300 @default.
• W2890877785 hasAuthorship W2890877785A5089203351 @default.
• W2890877785 hasConcept C105795698 @default.
• W2890877785 hasConcept C120665830 @default.
• W2890877785 hasConcept C121332964 @default.
• W2890877785 hasConcept C145148216 @default.
• W2890877785 hasConcept C161866238 @default.
• W2890877785 hasConcept C168834538 @default.
• W2890877785 hasConcept C171250308 @default.
• W2890877785 hasConcept C19067145 @default.
• W2890877785 hasConcept C192562407 @default.
• W2890877785 hasConcept C19499675 @default.
• W2890877785 hasConcept C22423302 @default.
• W2890877785 hasConcept C33923547 @default.
• W2890877785 hasConcept C50774322 @default.
• W2890877785 hasConcept C62520636 @default.
• W2890877785 hasConceptScore W2890877785C105795698 @default.
• W2890877785 hasConceptScore W2890877785C120665830 @default.
• W2890877785 hasConceptScore W2890877785C121332964 @default.
• W2890877785 hasConceptScore W2890877785C145148216 @default.
• W2890877785 hasConceptScore W2890877785C161866238 @default.
• W2890877785 hasConceptScore W2890877785C168834538 @default.
• W2890877785 hasConceptScore W2890877785C171250308 @default.
• W2890877785 hasConceptScore W2890877785C19067145 @default.
• W2890877785 hasConceptScore W2890877785C192562407 @default.
• W2890877785 hasConceptScore W2890877785C19499675 @default.
• W2890877785 hasConceptScore W2890877785C22423302 @default.
• W2890877785 hasConceptScore W2890877785C33923547 @default.
• W2890877785 hasConceptScore W2890877785C50774322 @default.
• W2890877785 hasConceptScore W2890877785C62520636 @default.
• W2890877785 hasFunder F4320307102 @default.
• W2890877785 hasIssue "49" @default.
• W2890877785 hasLocation W28908777851 @default.
• W2890877785 hasLocation W28908777852 @default.
• W2890877785 hasOpenAccess W2890877785 @default.
• W2890877785 hasPrimaryLocation W28908777851 @default.
• W2890877785 hasRelatedWork W1963346894 @default.
• W2890877785 hasRelatedWork W1990089368 @default.
• W2890877785 hasRelatedWork W2037441364 @default.
• W2890877785 hasRelatedWork W2090832859 @default.
• W2890877785 hasRelatedWork W2132925456 @default.
• W2890877785 hasRelatedWork W2307560028 @default.
• W2890877785 hasRelatedWork W2332768081 @default.
• W2890877785 hasRelatedWork W2518105562 @default.
• W2890877785 hasRelatedWork W2724302003 @default.
• W2890877785 hasRelatedWork W3012197531 @default.
• W2890877785 hasVolume "29" @default.
• W2890877785 isParatext "false" @default.
• W2890877785 isRetracted "false" @default.

• next