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• W2891495541 startingPage "295" @default.
• W2891495541 abstract "Bubble-free filling needs to be achieved to realize high-throughput mass production in ultraviolet nanoimprint lithography (UV-NIL). Polydimethylsiloxane (PDMS) is a gas-transmittable material because of its molecular features and is used as the base material for flexible molds in large-area UV-NIL. In this work, we investigated the filling behavior and mold release force of UV-NIL using a soft UV-curable PDMS mold in different atmospheres. Bubble-free filling was successfully demonstrated in air and 1,1,1,3,3-pentafluoropropane (PFP) gas atmosphere. The average release force following UV-NIL in PFP was 5.2 N, which was 70% smaller than that following UV-NIL in air. Defect-free fine nanopatterns with a width of 300 nm were fabricated by UV-NIL in PFP atmosphere." @default.
• W2891495541 created "2018-09-27" @default.
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• W2891495541 date "2018-06-25" @default.
• W2891495541 modified "2023-10-17" @default.
• W2891495541 title "Filling Behavior and Mold Release Force in UV Nanoimprinting Using PDMS Mold in Different Atmosphere" @default.
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• W2891495541 doi "https://doi.org/10.2494/photopolymer.31.295" @default.
• W2891495541 hasPublicationYear "2018" @default.
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