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- W2891946222 abstract "Ti-doped ZnO thin film on the glass substrate was synthesized by a dc magnetron sputtering system. A target in diameter of 60.0 mm and thickness of 3.0 mm was prepared by solid-state reaction (SSR) method from TiO2 and ZnO powders, then the Ti-containing confirmed by X-ray diffraction (XRD) technique. The deposition condition was under base pressure at 4.67 × 10−3Pa, operated at the pressure of 2.13 Pa, electrical current and voltage sputtering approximate of 120 mA and 500±5 V, respectively. The deposition time of 5 min was controlled the film thickness fixed around 100 nm. After deposition, the thin film samples were annealed at 373, 473 and 573 K for 60 min under a vacuum state. Phase identification, film thickness, Seebeck coefficient and electrical resistivity of as-deposited and annealed thin films were carried by the XRD technique, Tolansky method, steady-state method and Van der Pauw four-point probe method, respectively. It was found that the XRD results showed the thin film was crystal structure of ZnO at (200) peak preferred orientations. Base on thermoelectric properties, all samples displayed the n-type thermoelectricity. The effect of annealing treatment could be enhanced the power factor of Ti-doped ZnO thin film to be achieved a high power factor about of 0.76 µWm−1K−1 for annealed thin film 473 K, at room temperature." @default.
- W2891946222 created "2018-09-27" @default.
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- W2891946222 date "2018-01-01" @default.
- W2891946222 modified "2023-10-14" @default.
- W2891946222 title "Effect of annealing treatment on thermoelectric properties of Ti-doped ZnO thin film" @default.
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- W2891946222 doi "https://doi.org/10.1063/1.5053189" @default.
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