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W2892044648 abstract "For the back-end microfabrication in integrated circuits and for the manufacturing of light emitting diodes, proximity mask-aligner lithography is still the tool of choice, due to its simplicity and low costs. However, the downscaling of functional elements requires also to enhance the resolution of mask-aligners. We report on sub- $mathbf{2} mu mathbf{m}$ structures using a continuous wave laser exposure source emitting at 193 nm. By using the self-imaging Talbot effect of periodic structures, we demonstrate periods below 700 nm, as required for optical metastructures. Furthermore, we present an optimization technique for optical proximity correction in mask-aligner lithography." @default.
W2892044648 created "2018-09-27" @default.
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W2892044648 date "2018-07-01" @default.
W2892044648 modified "2023-09-30" @default.
W2892044648 title "Improving the Resolution in Mask-Aligner Lithography" @default.
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W2892044648 doi "https://doi.org/10.1109/omn.2018.8454655" @default.
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