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• W2892077498 abstract "Significant surface related degradation (SRD) is observed in samples passivated with either SiNx:H or AlOx:H/SiNx:H during treatment at 150 °C and 1 sun equivalent illumination intensity. Degradation of SiNx:H passivation is caused by a decrease of chemical passivation quality whereas degradation of AlOx:H/SiNx:H is caused by a decrease of fixed charge density. SRD is, however, strongly suppressed on highly doped silicon surfaces resulting from a diffusion step. Device simulations indicate that this cannot only be explained by reduced sensitivity to changes at the silicon surface due to the diffused region, and implications for defect formation are discussed." @default.
• W2892077498 created "2018-09-27" @default.
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• W2892077498 date "2018-12-01" @default.
• W2892077498 modified "2023-10-17" @default.
• W2892077498 title "Enhanced stability of passivation quality on diffused silicon surfaces under light-induced degradation conditions" @default.
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• W2892077498 doi "https://doi.org/10.1016/j.solmat.2018.08.019" @default.
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