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- W2893228875 abstract "The paper considers formation of Ba 0.8 Sr 0.2 TiO 3 ferroelectric films of MIS structures on silicon wafer with magnetron sputtering in HF discharge of the initial target material from the polycrystal ferroelectric in the oxygen atmosphere. Dielectric and volt-farad characteristics of MIS structures have been explored, depending on formation modes of Ba 0.8 Sr 0.2 TiO 3 ferroelectric films. The authors determined technological modes of film deposition for acquiring MIS structures with the best electrophysical properties." @default.
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- W2893228875 date "2018-09-01" @default.
- W2893228875 modified "2023-09-24" @default.
- W2893228875 title "Acquiring MIS Structures Based on Bа<sub>0.8</sub>Sr<sub>0.2</sub>TiО<sub>3 </sub>Ferroelectric Films and their Properties" @default.
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- W2893228875 doi "https://doi.org/10.4028/www.scientific.net/kem.781.20" @default.
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