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• W2893243549 abstract "Selective deoxygenation of graphene oxide has been conducted with regard with the design and fabrication of graphene based devices. The ion beam lithography is considered to be a powerful method for patterning onto graphene oxide foil. A helium beam has been used for both direct patterning onto graphene oxide foil and simultaneous online characterisation of its structural and compositional changes. Scanning electron microscopy, energy dispersive spectroscopy and Rutherford backscattering spectrometry analyses have been accurately employed to reveal and monitor the deoxygenation of the graphene oxide foil demonstrating the reliability of the direct patterning using the ion beam lithography technique." @default.
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• W2893243549 date "2018-01-01" @default.
• W2893243549 modified "2023-10-17" @default.
• W2893243549 title "Ion-beam lithography: A promising technique for the patterning of graphene oxide foil" @default.
• W2893243549 cites W1985167115 @default.
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• W2893243549 doi "https://doi.org/10.1063/1.5053388" @default.
• W2893243549 hasPublicationYear "2018" @default.
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