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- W2894890640 abstract "Deep ultraviolet (DUV) femtosecond laser repair of Cr binary and phase-shift photomasks is routine and well established over decades of practice. As Moore’s law progresses into sub-10 nm nodes, there is a necessary diversification of lithography technologies which can similarly benefit from the high-throughput, non-contact, contaminate-selective capabilities of ultrashort pulsed laser repair. These alternative lithography masks include extreme ultraviolet (EUV) TaN reflective and DUV SiN-based photomasks. Additionally, parametrically systematic studies are shown with intent to find the limits of selective, sub-resolution, removal of simulated soft defects in various patterns on DUV photomasks." @default.
- W2894890640 created "2018-10-12" @default.
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- W2894890640 date "2018-10-03" @default.
- W2894890640 modified "2023-09-27" @default.
- W2894890640 title "Ultrashort pulse laser repair of photomasks for advanced lithography technologies" @default.
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- W2894890640 doi "https://doi.org/10.1117/12.2501408" @default.
- W2894890640 hasPublicationYear "2018" @default.
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