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- W2895089358 abstract "Thin films of phase pure VO2 (M1 phase) are deposited on thermally grown oxide (Si/SiO2) substrate by reactive pulsed laser deposition of vanadium metal target. The influence of deposition parameters is studied by varying oxygen partial pressure while keeping other parameters constant. A thin film obtained at 50 mTorr is found to be phase pure by XRD and Raman spectral studies. SEM and AFM studies show smooth morphology with a surface roughness of 3–5 nm. The quality of the thin film was further established by characterizing the 68 °C (TSMT) transition by 2–3 orders of jump in resistance and a 60% change in reflectivity with minimum hysteresis. This single step process of deposition would be a suitable method for fabricating devices for smart window and metamaterial applications." @default.
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- W2895089358 date "2018-10-01" @default.
- W2895089358 modified "2023-10-18" @default.
- W2895089358 title "Synthesis of phase pure vanadium dioxide (VO2) thin film by reactive pulsed laser deposition" @default.
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- W2895089358 doi "https://doi.org/10.1063/1.5046455" @default.
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