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- W2895764532 abstract "In this paper, an analytical model for Dual Material Gate-Gate Stack-Elliptical Gate All Around (DMG-GS-EG) MOSFET is presented and by solving Poisson’s equation in cylindrical coordinates and using equivalent radius (R eqv ), the electrical properties of DMG-GS-EG are studied. A comparative analysis is also done with Single Material Gate-Elliptical Gate All Around (SMG-EG) MOSFET, Single Material Gate-Gate Stack-Elliptical Gate All Around (SMG-GS-EG) MOSFET and Dual Material Gate-Elliptical Gate All Around (DMG-EG) MOSFET to study the effectiveness of the proposed device in suppressing short-channel effects. A detailed analysis has been done over a wide range of parameters and bias conditions and it is shown that the proposed DMG-GS-EG device shows the most improved and reliable results." @default.
- W2895764532 created "2018-10-12" @default.
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- W2895764532 date "2018-02-01" @default.
- W2895764532 modified "2023-09-28" @default.
- W2895764532 title "Dual Material Gate-Gate Stack-Elliptical Gate All Around (DMG-GS-EG) MOSFET – A Novel Device Concept for Improved Performance" @default.
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- W2895764532 doi "https://doi.org/10.1109/icaecc.2018.8479447" @default.
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