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- W2895863059 abstract "FePd (001) films, prepared by an electron beam deposition system on MgO(100), exhibit a perpendicular magnetic anisotropy $(1.7times 10^{7} text{erg}/text{cc})$ with a high order parameter (0.92). The strain relaxation process in epitaxially grown thin-film is pretty common [1] and the strain relaxed induced defects were detailed analysed by high resolution transmission electron microscope(HRTEM), as shown in Fig. 1(a)-(c). The relation between stacking faults induced by the strain relaxation, which act as strong domain wall pinning sites, and perpendicular coercivity $(mathrm{H}_{mathrm{c},perp})$ of FePd films prepared at 400-700°C have been investigated. The variation of $mathrm{H}_{mathrm{c}}$ is shown in Fig. 1(d). $mathrm{H}_{mathrm{c},perp}$ can be enhanced via raising the stacking fault densities, which can be promoted by climbing dissociation [2]. The increased stacking fault densities with large $mathrm{H}_{mathrm{c},perp}(6text{kOe})$ is obtained for samples prepared at 650 °C. On the other hand, $mathrm{H}_{mathrm{c},perp}$ drops significantly prepared at 700°C and treated with post-annealing at 700°C for 5hs, resulting from reducing stacking fault density. This result suggests the coercivity can be manipulated via controlling stacking fault density in FePd film, which may pave a way for future magnetic devices." @default.
- W2895863059 created "2018-10-26" @default.
- W2895863059 creator A5015230450 @default.
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- W2895863059 date "2016-08-01" @default.
- W2895863059 modified "2023-09-24" @default.
- W2895863059 title "Stacking Faults Induced Domain Wall Pinning in (001) FePd Thin Film" @default.
- W2895863059 doi "https://doi.org/10.1109/icaums.2016.8479688" @default.
- W2895863059 hasPublicationYear "2016" @default.
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