FRINK Linked Data Fragments server

Matches in SemOpenAlex for { <https://semopenalex.org/work/W2895874509> ?p ?o ?g. }

• W2895874509 abstract "Abstract Understanding the growth mechanisms during the early stages of atomic layer deposition (ALD) is of interest for several applications including thin film deposition, catalysis, and area‐selective deposition. The surface dependence and growth mechanism of (ethylbenzyl)(1‐ethyl‐1,4‐cyclohexadienyl)ruthenium and O 2 ALD at 325 °C on HfO 2 , Al 2 O 3 , OH, and SiOSi terminated SiO 2 , and organosilicate glass (OSG) are investigated. The experimental results show that precursor adsorption is strongly affected by the surface termination of the dielectric, and proceeds most rapidly on OH terminated dielectrics, followed by SiOSi and finally SiCH 3 terminated dielectrics. The initial stages of growth are characterized by the formation and growth of Ru nanoparticles, which is mediated by the diffusion of Ru species. Mean‐field and kinetic Monte Carlo modeling show that ALD on OSG is best described when accounting for (1) cyclic generation of new nanoparticles at the surface, (2) surface diffusion of both atomic species and nanoparticles, and (3) size‐dependent nanoparticle reactivity. In particular, the models indicate that precursor adsorption initially occurs only on the dielectric substrate, and occurs on the Ru nanoparticles only when these reach a critical size of about 0.85 nm. This phenomenon is attributed to the catalytic decomposition of oxygen requiring a minimum Ru nanoparticle size." @default.
• W2895874509 created "2018-10-26" @default.
• W2895874509 creator A5016391854 @default.
• W2895874509 creator A5020571434 @default.
• W2895874509 creator A5035270980 @default.
• W2895874509 creator A5036420072 @default.
• W2895874509 creator A5055161765 @default.
• W2895874509 creator A5060844602 @default.
• W2895874509 creator A5085573082 @default.
• W2895874509 creator A5090253402 @default.
• W2895874509 date "2018-10-17" @default.
• W2895874509 modified "2023-10-18" @default.
• W2895874509 title "Diffusion‐Mediated Growth and Size‐Dependent Nanoparticle Reactivity during Ruthenium Atomic Layer Deposition on Dielectric Substrates" @default.
• W2895874509 cites W1967749052 @default.
• W2895874509 cites W1974340860 @default.
• W2895874509 cites W1977199911 @default.
• W2895874509 cites W1986449988 @default.
• W2895874509 cites W1987051237 @default.
• W2895874509 cites W1990227613 @default.
• W2895874509 cites W1990244367 @default.
• W2895874509 cites W1994403799 @default.
• W2895874509 cites W1995191254 @default.
• W2895874509 cites W1999720804 @default.
• W2895874509 cites W2014300566 @default.
• W2895874509 cites W2019902311 @default.
• W2895874509 cites W2022190942 @default.
• W2895874509 cites W2027622484 @default.
• W2895874509 cites W2034124623 @default.
• W2895874509 cites W2064671408 @default.
• W2895874509 cites W2069760501 @default.
• W2895874509 cites W2070023283 @default.
• W2895874509 cites W2070611256 @default.
• W2895874509 cites W2076838934 @default.
• W2895874509 cites W2082208389 @default.
• W2895874509 cites W2084984495 @default.
• W2895874509 cites W2088060504 @default.
• W2895874509 cites W2089637637 @default.
• W2895874509 cites W2090051746 @default.
• W2895874509 cites W2090245397 @default.
• W2895874509 cites W2090256122 @default.
• W2895874509 cites W2095169422 @default.
• W2895874509 cites W2095998274 @default.
• W2895874509 cites W2100258811 @default.
• W2895874509 cites W2117868972 @default.
• W2895874509 cites W2126819512 @default.
• W2895874509 cites W2137032131 @default.
• W2895874509 cites W2137108081 @default.
• W2895874509 cites W2158429211 @default.
• W2895874509 cites W2158932701 @default.
• W2895874509 cites W2164151751 @default.
• W2895874509 cites W2586836119 @default.
• W2895874509 cites W2612799908 @default.
• W2895874509 cites W2619601914 @default.
• W2895874509 cites W2734791465 @default.
• W2895874509 cites W2748656712 @default.
• W2895874509 cites W2767004806 @default.
• W2895874509 cites W2789892354 @default.
• W2895874509 cites W2803040449 @default.
• W2895874509 doi "https://doi.org/10.1002/admi.201800870" @default.
• W2895874509 hasPublicationYear "2018" @default.
• W2895874509 type Work @default.
• W2895874509 sameAs 2895874509 @default.
• W2895874509 citedByCount "47" @default.
• W2895874509 countsByYear W28958745092019 @default.
• W2895874509 countsByYear W28958745092020 @default.
• W2895874509 countsByYear W28958745092021 @default.
• W2895874509 countsByYear W28958745092022 @default.
• W2895874509 countsByYear W28958745092023 @default.
• W2895874509 crossrefType "journal-article" @default.
• W2895874509 hasAuthorship W2895874509A5016391854 @default.
• W2895874509 hasAuthorship W2895874509A5020571434 @default.
• W2895874509 hasAuthorship W2895874509A5035270980 @default.
• W2895874509 hasAuthorship W2895874509A5036420072 @default.
• W2895874509 hasAuthorship W2895874509A5055161765 @default.
• W2895874509 hasAuthorship W2895874509A5060844602 @default.
• W2895874509 hasAuthorship W2895874509A5085573082 @default.
• W2895874509 hasAuthorship W2895874509A5090253402 @default.
• W2895874509 hasBestOaLocation W28958745092 @default.
• W2895874509 hasConcept C111368507 @default.
• W2895874509 hasConcept C115537861 @default.
• W2895874509 hasConcept C121332964 @default.
• W2895874509 hasConcept C127313418 @default.
• W2895874509 hasConcept C127413603 @default.
• W2895874509 hasConcept C133386390 @default.
• W2895874509 hasConcept C142724271 @default.
• W2895874509 hasConcept C147789679 @default.
• W2895874509 hasConcept C150394285 @default.
• W2895874509 hasConcept C151730666 @default.
• W2895874509 hasConcept C155672457 @default.
• W2895874509 hasConcept C15696416 @default.
• W2895874509 hasConcept C161790260 @default.
• W2895874509 hasConcept C171250308 @default.
• W2895874509 hasConcept C178790620 @default.
• W2895874509 hasConcept C185592680 @default.
• W2895874509 hasConcept C19067145 @default.
• W2895874509 hasConcept C192562407 @default.
• W2895874509 hasConcept C204787440 @default.
• W2895874509 hasConcept C2776910235 @default.
• W2895874509 hasConcept C2777289219 @default.
• W2895874509 hasConcept C2816523 @default.

• next