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- W2895878057 abstract "We explore the impact of channel area scaling in InGaAs gate-all-around transistor for circular (CNW), square (SNW) and triangular (TNW) cross-sections using coupled selfconsistent Schrodinger-Poisson solver. We find that, among all three cross-sections, TNW shows the strongest confinement effect for all the considered dimensions. The confinement effects are significant at 10 nm for TNW and at 5 nm for SNW and CNW. We further analyzed the performance figure of merits (threshold voltage, current ON/OFF ratio, sub-threshold slope, ON current and intrinsic delay with cross-section area scaling) for all three cross-sections. Based on the scaling trend we find that CNW with 10 nm diameter is the most optimum among all three crosssections." @default.
- W2895878057 created "2018-10-26" @default.
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- W2895878057 date "2018-03-01" @default.
- W2895878057 modified "2023-09-27" @default.
- W2895878057 title "Diameter Scaling in III-V Gate-All-Around Transistor for Different Cross-Sections" @default.
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- W2895878057 doi "https://doi.org/10.1109/conecct.2018.8482365" @default.
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