Matches in SemOpenAlex for { <https://semopenalex.org/work/W2895963162> ?p ?o ?g. }
Showing items 1 to 96 of
96
with 100 items per page.
- W2895963162 abstract "Mask Process Correction (MPC) is well established as a necessary step in mask data preparation (MDP) for electron beam mask manufacturing at advanced technology nodes from 14nm and beyond. MPC typically uses an electron scatter model to represent e-beam exposure and a process model to represent develop and etch process effects [1]. The models are used to iteratively simulate the position of layout feature edges and move edge segments to maximize the edge position accuracy of the completed mask. Selective dose assignment can be used in conjunction with edge movement to simultaneously maximize process window and edge position accuracy [2]. MPC methodology for model calibration and layout correction has been developed and optimized for the vector shaped beam (VSB) mask writers that represent the dominant mask lithography technology in use today for advanced mask manufacturing [3]. Multi-beam mask writers (MBMW) have recently been introduced and are now beginning to be used in volume photomask production [4]. These new tools are based on massively parallel raster scan architectures that significantly reduce the dependence of write time on layout complexity and are expected to augment and eventually replace VSB technology for advanced node masks as layout complexity continues to grow [5][6]. While it is expected that existing MPC methods developed for VSB lithography can be easily adapted to MBMW, a rigorous examination of mask error correction for MBMW is necessary to fully confirm applicability of current tools and methods, and to identify any modifications that may be required to achieve the desired CD performance of MBMW. In this paper we will present the results of such a study and confirm the readiness of MPC for multi-beam mask lithography." @default.
- W2895963162 created "2018-10-26" @default.
- W2895963162 creator A5008299200 @default.
- W2895963162 creator A5042490524 @default.
- W2895963162 creator A5043665756 @default.
- W2895963162 creator A5044266820 @default.
- W2895963162 creator A5051977094 @default.
- W2895963162 creator A5053802399 @default.
- W2895963162 creator A5059502787 @default.
- W2895963162 creator A5068704655 @default.
- W2895963162 creator A5069242246 @default.
- W2895963162 creator A5079104506 @default.
- W2895963162 creator A5083449149 @default.
- W2895963162 creator A5087854201 @default.
- W2895963162 creator A5090022683 @default.
- W2895963162 date "2018-11-12" @default.
- W2895963162 modified "2023-09-26" @default.
- W2895963162 title "Mask process correction validation for multi-beam mask lithography" @default.
- W2895963162 cites W1980141541 @default.
- W2895963162 cites W2110314919 @default.
- W2895963162 doi "https://doi.org/10.1117/12.2503284" @default.
- W2895963162 hasPublicationYear "2018" @default.
- W2895963162 type Work @default.
- W2895963162 sameAs 2895963162 @default.
- W2895963162 citedByCount "5" @default.
- W2895963162 countsByYear W28959631622019 @default.
- W2895963162 countsByYear W28959631622021 @default.
- W2895963162 countsByYear W28959631622022 @default.
- W2895963162 countsByYear W28959631622023 @default.
- W2895963162 crossrefType "proceedings-article" @default.
- W2895963162 hasAuthorship W2895963162A5008299200 @default.
- W2895963162 hasAuthorship W2895963162A5042490524 @default.
- W2895963162 hasAuthorship W2895963162A5043665756 @default.
- W2895963162 hasAuthorship W2895963162A5044266820 @default.
- W2895963162 hasAuthorship W2895963162A5051977094 @default.
- W2895963162 hasAuthorship W2895963162A5053802399 @default.
- W2895963162 hasAuthorship W2895963162A5059502787 @default.
- W2895963162 hasAuthorship W2895963162A5068704655 @default.
- W2895963162 hasAuthorship W2895963162A5069242246 @default.
- W2895963162 hasAuthorship W2895963162A5079104506 @default.
- W2895963162 hasAuthorship W2895963162A5083449149 @default.
- W2895963162 hasAuthorship W2895963162A5087854201 @default.
- W2895963162 hasAuthorship W2895963162A5090022683 @default.
- W2895963162 hasConcept C111919701 @default.
- W2895963162 hasConcept C120665830 @default.
- W2895963162 hasConcept C121332964 @default.
- W2895963162 hasConcept C127413603 @default.
- W2895963162 hasConcept C14737013 @default.
- W2895963162 hasConcept C154945302 @default.
- W2895963162 hasConcept C162307627 @default.
- W2895963162 hasConcept C171250308 @default.
- W2895963162 hasConcept C181844469 @default.
- W2895963162 hasConcept C192562407 @default.
- W2895963162 hasConcept C204223013 @default.
- W2895963162 hasConcept C24326235 @default.
- W2895963162 hasConcept C2777441419 @default.
- W2895963162 hasConcept C2779227376 @default.
- W2895963162 hasConcept C41008148 @default.
- W2895963162 hasConcept C53524968 @default.
- W2895963162 hasConcept C78371743 @default.
- W2895963162 hasConcept C98045186 @default.
- W2895963162 hasConceptScore W2895963162C111919701 @default.
- W2895963162 hasConceptScore W2895963162C120665830 @default.
- W2895963162 hasConceptScore W2895963162C121332964 @default.
- W2895963162 hasConceptScore W2895963162C127413603 @default.
- W2895963162 hasConceptScore W2895963162C14737013 @default.
- W2895963162 hasConceptScore W2895963162C154945302 @default.
- W2895963162 hasConceptScore W2895963162C162307627 @default.
- W2895963162 hasConceptScore W2895963162C171250308 @default.
- W2895963162 hasConceptScore W2895963162C181844469 @default.
- W2895963162 hasConceptScore W2895963162C192562407 @default.
- W2895963162 hasConceptScore W2895963162C204223013 @default.
- W2895963162 hasConceptScore W2895963162C24326235 @default.
- W2895963162 hasConceptScore W2895963162C2777441419 @default.
- W2895963162 hasConceptScore W2895963162C2779227376 @default.
- W2895963162 hasConceptScore W2895963162C41008148 @default.
- W2895963162 hasConceptScore W2895963162C53524968 @default.
- W2895963162 hasConceptScore W2895963162C78371743 @default.
- W2895963162 hasConceptScore W2895963162C98045186 @default.
- W2895963162 hasLocation W28959631621 @default.
- W2895963162 hasOpenAccess W2895963162 @default.
- W2895963162 hasPrimaryLocation W28959631621 @default.
- W2895963162 hasRelatedWork W1986705012 @default.
- W2895963162 hasRelatedWork W1992109271 @default.
- W2895963162 hasRelatedWork W2000358180 @default.
- W2895963162 hasRelatedWork W2007966539 @default.
- W2895963162 hasRelatedWork W2052805415 @default.
- W2895963162 hasRelatedWork W2069099957 @default.
- W2895963162 hasRelatedWork W2082242552 @default.
- W2895963162 hasRelatedWork W4297824422 @default.
- W2895963162 hasRelatedWork W2082196138 @default.
- W2895963162 hasRelatedWork W2083408846 @default.
- W2895963162 isParatext "false" @default.
- W2895963162 isRetracted "false" @default.
- W2895963162 magId "2895963162" @default.
- W2895963162 workType "article" @default.