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• W2896095392 abstract "Abstract The hexafluoropropylene oxide, C 3 F 6 O (HFPO), is commonly used in technological processes involving low-temperature plasmas. In relevance to such processes, we investigate the electron ionization and attachment to HFPO molecules in various cluster environments. Either pure (HFPO) N clusters or the clusters deposited on larger argon nanoparticles (HFPO) N · Ar M are generated in molecular beams in vacuum. The cluster beam is intercepted with a beam of either slow (0–15 eV) or faster (70 eV) electrons, yielding negative or positive ions, respectively, and their mass spectra are recorded. Qualitatively, the spectra of free and Ar-deposited clusters are similar, exhibiting the same ion fragments. The cluster environment suppresses the fragmentation after ionization for both positively and negatively charged clusters, namely, the parent ions (HFPO)n+/− are present in the spectra. The fragmentation is more suppressed in the Ar-deposited clusters. In both the positive ionization and attachment, new fragmentation channels or ion-molecule reactions in the clusters lead to production of new fragments not observed in the gas phase. Mechanisms of these reactions and ionization processes are discussed." @default.
• W2896095392 created "2018-10-26" @default.
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• W2896095392 date "2019-01-01" @default.
• W2896095392 modified "2023-10-12" @default.
• W2896095392 title "Positive ionization and electron attachment of hexafluoropropylene oxide in different cluster environments" @default.
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• W2896095392 doi "https://doi.org/10.1016/j.ijms.2018.10.018" @default.
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