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- W289682382 abstract "1 Introduction Recently much attention has been devoted to the study on the deposition and properties of oxide films. Oxide thin films, such as MgO, SiO_2 and ZrO_2, not only can be used as insulating layers in electronic devices but also act as buffer layers which can effectively obstruct the interface reaction between substrates and films or different layers. Moreover, in the technology of multilayer structures and Josephson junctions, it is also needed to grow insulating layers with perfect epitaxial structure. Up to now, it has been experimentally proved that a variety of oxide thin films can be used as buffer layers or" @default.
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- W289682382 date "1993-10-28" @default.
- W289682382 modified "2023-09-27" @default.
- W289682382 title "Preparation of MgO Thin Films by Dual Ion Beam Sputtering" @default.
- W289682382 doi "https://doi.org/10.1360/sb1993-38-20-1703" @default.
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