FRINK Linked Data Fragments server

Matches in SemOpenAlex for { <https://semopenalex.org/work/W2897335952> ?p ?o ?g. }

• W2897335952 endingPage "38620" @default.
• W2897335952 startingPage "38610" @default.
• W2897335952 abstract "Cleaning and passivation of metal surfaces are necessary steps for selective film deposition processes that are attractive for some microelectronic applications (e.g., fully aligned vias or self-aligned contacts). For copper, there is limited knowledge about the mechanisms of the copper oxide reduction process and subsequent passivation layer formation reactions. We have investigated the in situ cleaning (i.e., oxidation and reduction by vapor-phase species) and passivation of chemical–mechanical polishing (CMP)-prepared Cu films in an effort to derive the mechanisms associated with selectively tailoring the surface chemistry. By monitoring the interaction of vapor-phase ethanol with the surface species generated after ozone cleaning at 300 °C, we find that the optimum procedure to remove these species and avoid byproduct redeposition is to use atomic layer deposition (ALD)-like binary cycles of ethanol and N2, with active pumping. We have further explored passivation of clean Cu using benzotriazole and 2,2′-bipyridine in an ALD environment. Both molecules chemisorb on clean Cu in an upright orientation, with respect to the metal surface at temperatures higher than the melting point of the organic inhibitors (100 ≤ T < 300 °C). Both molecules desorb without decomposition from clean Cu above 300 °C but not from Cu2O. Previous studies related to the passivation of Cu surfaces using heterocyclic amines have focused on solution-based or ultrahigh vacuum applications of the passivation molecules onto single crystalline Cu samples. The present work explores more industrially relevant vapor-phase passivation of CMP-cleaned, electroplated Cu samples using ALD-like processing conditions and in situ vapor-phase cleaning." @default.
• W2897335952 created "2018-10-26" @default.
• W2897335952 creator A5035213896 @default.
• W2897335952 creator A5037246643 @default.
• W2897335952 creator A5051239060 @default.
• W2897335952 creator A5056092627 @default.
• W2897335952 creator A5064677684 @default.
• W2897335952 date "2018-10-18" @default.
• W2897335952 modified "2023-09-30" @default.
• W2897335952 title "Vapor-Phase Cleaning and Corrosion Inhibition of Copper Films by Ethanol and Heterocyclic Amines" @default.
• W2897335952 cites W1549613164 @default.
• W2897335952 cites W1970674409 @default.
• W2897335952 cites W1970837937 @default.
• W2897335952 cites W1981213143 @default.
• W2897335952 cites W1983376760 @default.
• W2897335952 cites W1990664170 @default.
• W2897335952 cites W1992832637 @default.
• W2897335952 cites W1998377008 @default.
• W2897335952 cites W1999574532 @default.
• W2897335952 cites W2002772671 @default.
• W2897335952 cites W2006165603 @default.
• W2897335952 cites W2007736293 @default.
• W2897335952 cites W2008872357 @default.
• W2897335952 cites W2009320832 @default.
• W2897335952 cites W2009960779 @default.
• W2897335952 cites W2010154632 @default.
• W2897335952 cites W2010766880 @default.
• W2897335952 cites W2011764801 @default.
• W2897335952 cites W2021593340 @default.
• W2897335952 cites W2026877207 @default.
• W2897335952 cites W2029147333 @default.
• W2897335952 cites W2030398259 @default.
• W2897335952 cites W2032115607 @default.
• W2897335952 cites W2033299403 @default.
• W2897335952 cites W2037604442 @default.
• W2897335952 cites W2039322140 @default.
• W2897335952 cites W2039419914 @default.
• W2897335952 cites W2042003689 @default.
• W2897335952 cites W2043433703 @default.
• W2897335952 cites W2048278912 @default.
• W2897335952 cites W2048938349 @default.
• W2897335952 cites W2050482233 @default.
• W2897335952 cites W2052570926 @default.
• W2897335952 cites W2055740220 @default.
• W2897335952 cites W2062715294 @default.
• W2897335952 cites W2070372443 @default.
• W2897335952 cites W2072257002 @default.
• W2897335952 cites W2076708112 @default.
• W2897335952 cites W2078694734 @default.
• W2897335952 cites W2080305221 @default.
• W2897335952 cites W2081560012 @default.
• W2897335952 cites W2083498072 @default.
• W2897335952 cites W2086874992 @default.
• W2897335952 cites W2094721579 @default.
• W2897335952 cites W2105680920 @default.
• W2897335952 cites W2107418386 @default.
• W2897335952 cites W2128259086 @default.
• W2897335952 cites W2137032131 @default.
• W2897335952 cites W2152224839 @default.
• W2897335952 cites W2159780052 @default.
• W2897335952 cites W2160000511 @default.
• W2897335952 cites W2166061763 @default.
• W2897335952 cites W2226082717 @default.
• W2897335952 cites W2301919349 @default.
• W2897335952 cites W2302019286 @default.
• W2897335952 cites W2319475670 @default.
• W2897335952 cites W2329766664 @default.
• W2897335952 cites W2332506762 @default.
• W2897335952 cites W2346350493 @default.
• W2897335952 cites W2512759483 @default.
• W2897335952 cites W2527092151 @default.
• W2897335952 cites W2556404947 @default.
• W2897335952 cites W2582721814 @default.
• W2897335952 cites W2593666407 @default.
• W2897335952 cites W2752505286 @default.
• W2897335952 cites W2764172196 @default.
• W2897335952 cites W2795796899 @default.
• W2897335952 cites W2950934068 @default.
• W2897335952 cites W4241729422 @default.
• W2897335952 cites W4245837324 @default.
• W2897335952 doi "https://doi.org/10.1021/acsami.8b13438" @default.
• W2897335952 hasPubMedId "https://pubmed.ncbi.nlm.nih.gov/30335353" @default.
• W2897335952 hasPublicationYear "2018" @default.
• W2897335952 type Work @default.
• W2897335952 sameAs 2897335952 @default.
• W2897335952 citedByCount "16" @default.
• W2897335952 countsByYear W28973359522019 @default.
• W2897335952 countsByYear W28973359522020 @default.
• W2897335952 countsByYear W28973359522021 @default.
• W2897335952 countsByYear W28973359522022 @default.
• W2897335952 countsByYear W28973359522023 @default.
• W2897335952 crossrefType "journal-article" @default.
• W2897335952 hasAuthorship W2897335952A5035213896 @default.
• W2897335952 hasAuthorship W2897335952A5037246643 @default.
• W2897335952 hasAuthorship W2897335952A5051239060 @default.
• W2897335952 hasAuthorship W2897335952A5056092627 @default.
• W2897335952 hasAuthorship W2897335952A5064677684 @default.
• W2897335952 hasConcept C127413603 @default.

• next