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- W2897949052 abstract "Cover: The cover picture describes a facile method for multi-tiered polymer nanopatterning by the combination of imprint- and photo-lithography. Imprint lithography generates nano-scale patterns by utilizing a hemispheric PDMS pad and a flexible mold, and subsequent photolithographic process imparts multi-tier to the imprinted nanopatterns. Further details can be found in the article N. Y. Lee and Y. S. Kim* on page 1995." @default.
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- W2897949052 date "2007-10-15" @default.
- W2897949052 modified "2023-10-18" @default.
- W2897949052 title "Macromol. Rapid Commun. 20/2007" @default.
- W2897949052 doi "https://doi.org/10.1002/marc.200790038" @default.
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