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- W2898980008 endingPage "565" @default.
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- W2898980008 abstract "Carbon, one of the most abundant materials, is very attractive for many applications because it exists in a variety of forms based on dimensions, such as zero-dimensional (0D), one-dimensional (1D), two-dimensional (2D), and-three dimensional (3D). Carbon nanowall (CNW) is a vertically-oriented 2D form of a graphene-like structure with open boundaries, sharp edges, nonstacking morphology, large interlayer spacing, and a huge surface area. Plasma-enhanced chemical vapor deposition (PECVD) is widely used for the large-scale synthesis and functionalization of carbon nanowalls (CNWs) with different types of plasma activation. Plasma-enhanced techniques open up possibilities to improve the structure and morphology of CNWs by controlling the plasma discharge parameters. Plasma-assisted surface treatment on CNWs improves their stability against structural degradation and surface chemistry with enhanced electrical and chemical properties. These advantages broaden the applications of CNWs in electrochemical energy storage devices, catalysis, and electronic devices and sensing devices to extremely thin black body coatings. However, the controlled growth of CNWs for specific applications remains a challenge. In these aspects, this review discusses the growth of CNWs using different plasma activation, the influence of various plasma-discharge parameters, and plasma-assisted surface treatment techniques for tailoring the properties of CNWs. The challenges and possibilities of CNW-related research are also discussed." @default.
- W2898980008 created "2018-11-09" @default.
- W2898980008 creator A5000021004 @default.
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- W2898980008 creator A5091853924 @default.
- W2898980008 date "2018-11-01" @default.
- W2898980008 modified "2023-10-08" @default.
- W2898980008 title "Oriented Carbon Nanostructures by Plasma Processing: Recent Advances and Future Challenges" @default.
- W2898980008 cites W1133674736 @default.
- W2898980008 cites W11476871 @default.
- W2898980008 cites W1207121387 @default.
- W2898980008 cites W1963698410 @default.
- W2898980008 cites W1967901907 @default.
- W2898980008 cites W1975169083 @default.
- W2898980008 cites W1975420103 @default.
- W2898980008 cites W1975974590 @default.
- W2898980008 cites W1976811610 @default.
- W2898980008 cites W1978107667 @default.
- W2898980008 cites W1979557367 @default.
- W2898980008 cites W1985040679 @default.
- W2898980008 cites W1985510760 @default.
- W2898980008 cites W1988539495 @default.
- W2898980008 cites W1990349649 @default.
- W2898980008 cites W1990487654 @default.
- W2898980008 cites W1993277415 @default.
- W2898980008 cites W1995658206 @default.
- W2898980008 cites W1997159984 @default.
- W2898980008 cites W1998075647 @default.
- W2898980008 cites W1998868809 @default.
- W2898980008 cites W1999375177 @default.
- W2898980008 cites W1999597598 @default.
- W2898980008 cites W2000442330 @default.
- W2898980008 cites W2000609119 @default.
- W2898980008 cites W2001540022 @default.
- W2898980008 cites W2002292760 @default.
- W2898980008 cites W2007526446 @default.
- W2898980008 cites W2009382192 @default.
- W2898980008 cites W2009446045 @default.
- W2898980008 cites W2011337349 @default.
- W2898980008 cites W2013396114 @default.
- W2898980008 cites W2013453955 @default.
- W2898980008 cites W2014225038 @default.
- W2898980008 cites W2014894405 @default.
- W2898980008 cites W2015660447 @default.
- W2898980008 cites W2018804230 @default.
- W2898980008 cites W2018908354 @default.
- W2898980008 cites W2018912339 @default.
- W2898980008 cites W2023087360 @default.
- W2898980008 cites W2024074523 @default.
- W2898980008 cites W2027521932 @default.
- W2898980008 cites W2027952847 @default.
- W2898980008 cites W2028132113 @default.
- W2898980008 cites W2030752939 @default.
- W2898980008 cites W2033060486 @default.
- W2898980008 cites W2035189541 @default.
- W2898980008 cites W2035775157 @default.
- W2898980008 cites W2036139233 @default.
- W2898980008 cites W2039818491 @default.
- W2898980008 cites W2040142942 @default.
- W2898980008 cites W2042788897 @default.
- W2898980008 cites W2044938873 @default.
- W2898980008 cites W2045205512 @default.
- W2898980008 cites W2045423611 @default.
- W2898980008 cites W2046328987 @default.
- W2898980008 cites W2048041340 @default.
- W2898980008 cites W2048579435 @default.
- W2898980008 cites W2048748427 @default.
- W2898980008 cites W2049905650 @default.
- W2898980008 cites W2050655560 @default.
- W2898980008 cites W2056268785 @default.
- W2898980008 cites W2057965367 @default.
- W2898980008 cites W2058122340 @default.
- W2898980008 cites W2062636069 @default.
- W2898980008 cites W2063637001 @default.
- W2898980008 cites W2063655592 @default.
- W2898980008 cites W2064259969 @default.
- W2898980008 cites W2065751491 @default.
- W2898980008 cites W2065905150 @default.
- W2898980008 cites W2067749730 @default.
- W2898980008 cites W2068261551 @default.
- W2898980008 cites W2068510218 @default.
- W2898980008 cites W2071963213 @default.
- W2898980008 cites W2073599618 @default.
- W2898980008 cites W2074357801 @default.
- W2898980008 cites W2075433323 @default.
- W2898980008 cites W2076767250 @default.
- W2898980008 cites W2078119071 @default.
- W2898980008 cites W2078402116 @default.
- W2898980008 cites W2080163975 @default.
- W2898980008 cites W2080351487 @default.
- W2898980008 cites W2080418885 @default.
- W2898980008 cites W2082499804 @default.