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- W2899124489 abstract "We observed the deposition phenomena of an inorganic layer contamination by impurities during multi-layer plasma-enlanced atomic layer deposition (PEALD) for flexible electronics encapsulation. By in-situ optical emission spectroscopy (OES), we monitored the generation and decay of impurities which is originated from nearby organic layer, and predicted the effect of the impurities on an as-deposited layer. Material analysis (TEM and XPS) by impurity contaminated aluminum oxide layer conicides with in-situ OES measurements. We found that the effect of impurities on the alumina layer during organic-inorganic multilayer process are dependent to organic bond strength and oxygen radical reactivity. Effect of impurities on the passivation layer WVTR characteristics and shortening life-time of a flexible electronics will be further discussed." @default.
- W2899124489 created "2018-11-09" @default.
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- W2899124489 date "2017-05-01" @default.
- W2899124489 modified "2023-10-10" @default.
- W2899124489 title "Observation of Inorganic Layer Contamination by Impurities Originated From Organic Layers During Multilayer PEALD Process for Flexible Electronics Encapsulation" @default.
- W2899124489 doi "https://doi.org/10.1109/plasma.2017.8496303" @default.
- W2899124489 hasPublicationYear "2017" @default.
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