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• W2900361523 abstract "Atomic layer deposition (ALD) represents a unique deposition technique that allows to coat uniformly various high aspect ratio (HAR) porous nanostructures, in addition to its traditional role to coat flat substrates (e.g. Si wafers). Self-organized anodic TiO2 nanotube (TNT) layers belong among the most investigated inorganic nanostructures. They possess highly functional materials with promising application potential across many technological fields. Herein, we review the utilization of ALD for the functionalization of anodic TNT layers by secondary materials to advance their physicochemical and photoelectrochemical properties. First, the application of ALD for functionalization of porous aluminium oxide, which represent fundamental HAR nanostructure, is briefly introduced. Then the main experimental parameters governing the uniformity and the conformality of ALD coating within HAR nanostructures are discussed. Finally, the review focuses on the use of ALD to deposit secondary materials into TNT layers for various purposes — the introduction of pioneering studies is followed by particular examples of ALD based functionalizations of coated TNT layers for optimized visible-light absorption, charge separation and passivation, (photo)catalysis, stability, gas sensing, and energy storage." @default.
• W2900361523 created "2018-11-16" @default.
• W2900361523 creator A5027743569 @default.
• W2900361523 creator A5029532556 @default.
• W2900361523 creator A5030435023 @default.
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• W2900361523 creator A5036544948 @default.
• W2900361523 creator A5049778907 @default.
• W2900361523 creator A5050580325 @default.
• W2900361523 creator A5060730651 @default.
• W2900361523 creator A5068467561 @default.
• W2900361523 date "2019-03-01" @default.
• W2900361523 modified "2023-10-16" @default.
• W2900361523 title "One-dimensional anodic TiO2 nanotubes coated by atomic layer deposition: Towards advanced applications" @default.
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