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- W2901618335 abstract "Neodymium niobate NdNbO 4 (NNO) and tantalate NdTaO 4 (NTO) thin films (~100 nm) were prepared by sol‐gel/spin‐coating process on Al 2 O 3 substrate with LaNbO 4 /PbZrO 3 interlayer and annealing at 1000°C. Surface chemistry was investigated by X‐ray photoelectron spectroscopy (XPS). The core‐level XPS studies of sol‐gel NNO and NTO were performed for the first time. The binding energy differences Δ(O―Nb) and Δ(O―Ta) were used to characterize average energies of Nb―O bonding in NNO (322.9 eV) and Ta―O bonding in NTO (504.2 eV). The XPS demonstrated single valence state of Nd (Nd 3+ ) in precursors. Nd concentration (at. %) decreases from 22% in precursors to 7% in films considering the substrate contains C, Al, Si, Pb, and Zr elements (37%) at Nb or Ta (5%) and O (51%). The X‐ray diffraction analyses verified formation of the monoclinic (M‐NdNbO 4 or M′‐NdTaO 4 ), orthorhombic (O‐NdNbO 4 ) and tetragonal (T‐NdTaO 4 ) phases in precursors and films. Single valence state of Nd 3+ was confirmed in these films designed for the application in environmental electrolytic thin film devices." @default.
- W2901618335 created "2018-11-29" @default.
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- W2901618335 date "2018-11-12" @default.
- W2901618335 modified "2023-10-18" @default.
- W2901618335 title "X-ray photoelectron spectroscopy study of neodymium niobate and tantalate precursors and thin films" @default.
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- W2901618335 doi "https://doi.org/10.1002/sia.6583" @default.
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