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- W2903014767 abstract "Passivation quality of silicon nitride (SiNx), aluminum oxide (AlOx) and a stack of AlOx/SiNx has been investigated in the presence and absence of a thin silicon oxide (SiOx) layer formed using ozonated deionized water. Lifetime measurements show ≈3ms effective carrier lifetime (τeff) for the stack of AlOx/SiNx in the presence of the oxide. Low saturation current density (Jo) and interfacial trap density (D <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>it</sub> ) confirm and explain the high τ <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>eff</sub> for this sample. The stack of AlOx/SiNx can offer excellent surface passivation because of both field-effect passivation and chemical passivation. Note that the presence of oxide also shows a crucial impact in achieving a good passivation." @default.
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- W2903014767 date "2017-06-01" @default.
- W2903014767 modified "2023-09-29" @default.
- W2903014767 title "Improving Silicon Surface Passivation with a Silicon Oxide Layer Grown via Ozonated Deionized Water" @default.
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- W2903014767 doi "https://doi.org/10.1109/pvsc.2017.8366153" @default.
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