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• W2903465448 abstract "A deposition of polysiloxane coating on titanium substrate by means of atmospheric pressure plasma enhanced chemical vapor deposition (PECVD) in a runaway electron preionized diffuse discharge (REP DD) has been investigated. The coating was produced from vapor of hexomethyldisiloxane (HMDSO) diluted in nitrogen at a flow rate of 1 nl/min. After deposition, the mechanical properties of the coatings have been measured by means of a nanoidentation. The maximum nanohardness of the coating with 3 μm thickness was 4.7 GPa. Energy dispersive analysis has shown that the coatings contain a significant content of carbon and titanium (about 52 at. %, 32 at. %, respectively) and a low content of silicon (about 16 at. %). In the FTIR spectrum, high intensity bands corresponding to stretching vibrations of the Si-O-Si, the Si(CH3)x and CH3 groups are observed, that indicates the organic and inorganic coating structure. Carbon free coating can be produced by REP DD plasma treatment of the deposited SiOxCyHz film, when REP DD operated only in nitrogen." @default.
• W2903465448 created "2018-12-11" @default.
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• W2903465448 date "2018-11-01" @default.
• W2903465448 modified "2023-09-25" @default.
• W2903465448 title "Deposition of polysiloxane coatings by runaway electrons preionized diffuse discharge in nitrogen flow" @default.
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• W2903465448 doi "https://doi.org/10.1088/1742-6596/1115/3/032069" @default.
• W2903465448 hasPublicationYear "2018" @default.
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