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- W2904334993 abstract "This paper reports for the first time that by subjecting electron beam exposed SU-8 to a post exposure delay of one hour, the resist contrast improves ten-fold. Thereafter, hard bake process is introduced to reduce resist peel off from the substrate. The SU-8 is used as a hard mask to fabricate 90° pillars on Si substrate with an etch selectivity of ~1:60. High refractive index Si pillars and low refractive index air gap form the building block of dielectric Bragg mirror. In total, two sets of Si-air mirrors sandwich a varying cavity length on each side. The linear variable optical filter (LVOF) is measured and characterized using a bench-top spectrometer as well as scanning electron microscopy. The filter has a bandpass from 3100 to 3900 nm and a scallop size of 30 nm which outperforms the $lambda/10$ norm." @default.
- W2904334993 created "2018-12-22" @default.
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- W2904334993 date "2018-04-01" @default.
- W2904334993 modified "2023-10-05" @default.
- W2904334993 title "Two-Step Fabrication of Mid-Infrared Linear Variable Optical Filter Using SU-8 as Mask" @default.
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- W2904334993 doi "https://doi.org/10.1109/nems.2018.8556967" @default.
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