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• W2904382223 abstract "High-performance H:SiON single layer thin film encapsulation (TFE) was deposited by plasma enhanced chemical vapor deposition (PECVD) method. To control the characteristics of the SiON thin films, hydrogen gas was introduced during PECVD process." @default.
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• W2904382223 date "2019-01-01" @default.
• W2904382223 modified "2023-10-11" @default.
• W2904382223 title "High-performance thin H:SiON OLED encapsulation layer deposited by PECVD at low temperature" @default.
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• W2904382223 doi "https://doi.org/10.1039/c8ra08449a" @default.
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