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• W2912176220 abstract "The knowledge of how oxygen atoms are distributed at a magnetic-metal/oxide, or magnetic-metal/non-magnetic-metal interface, can be a useful tool to optimize device production. Multilayered Ni 81 Fe 19 /Ta samples consisting of 15 bilayers of 2.5 nm each, grown onto glass substrates by magnetron sputtering from Ni 81 Fe 19 and Ta targets, have been investigated. X-ray absorption near edge structure, extended X-ray absorption fine structure, small angle X-ray diffraction, and simulations were used to characterize the samples. Oxygen atoms incorporated onto Ni 81 Fe 19 films during O 2 exposition are mainly bonded to Fe atoms. This partial oxidation of the Ni 81 Fe 19 surface works as a barrier to arriving Ta atoms, preventing intermixing at the Ni 81 Fe 19 /Ta interface. The reduction of the Ni 81 Fe 19 surface by the formation of TaO x is observed." @default.
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• W2912176220 date "2019-02-19" @default.
• W2912176220 modified "2023-10-18" @default.
• W2912176220 title "Distribution of Oxygen at the Ni81Fe19/Ta Interface" @default.
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• W2912176220 doi "https://doi.org/10.1155/2019/1382505" @default.
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