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• W2912232457 abstract "Previous studies showed that cobalt silicide can form ohmic contacts to p-type 6H-SiC by directly reacting cobalt with 6H-SiC. Similar results can be achieved on 4H-SiC, given the similarities between the different silicon carbide polytypes. However, previous studies using multilayer deposition of silicon/cobalt on 4H-SiC gave ohmic contacts to n-type. In this study, we investigated the cobalt silicide/4H-SiC system to answer two research questions. Can cobalt contacts be self-aligned to contact holes to 4H-SiC? Are the self-aligned contacts ohmic to n-type, p-type, both or neither? Using x-ray diffraction, it was found that a mixture of silicides ( $$hbox {Co}_2hbox {Si}$$ and CoSi) was reliably formed at 800 $$^circ $$ C using rapid thermal processing. The cobalt silicide mixture becomes ohmic to epitaxially grown n-type ( $$1times 10^{19} hbox {cm}^{-3}$$ ) if annealed at 1000 $$^circ $$ C, while it shows rectifying properties to epitaxially grown p-type ( $$1times 10^{19} hbox {cm}^{-3}$$ ) for all tested anneal temperatures in the range 800–1000 $$^circ $$ C. The specific contact resistivity ( $$rho _mathrm{C}$$ ) to n-type was $$4.3 times 10^{-4}$$ $$mathrm {Omega }$$ $$,hbox {cm}^{2}$$ . This work opens the possibility to investigate other self-aligned contacts to silicon carbide." @default.
• W2912232457 created "2019-02-21" @default.
• W2912232457 creator A5017072976 @default.
• W2912232457 creator A5054735459 @default.
• W2912232457 creator A5058433938 @default.
• W2912232457 date "2019-02-12" @default.
• W2912232457 modified "2023-10-09" @default.
• W2912232457 title "Investigation of a Self-Aligned Cobalt Silicide Process for Ohmic Contacts to Silicon Carbide" @default.
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• W2912232457 doi "https://doi.org/10.1007/s11664-019-07020-0" @default.
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