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- W2912394440 abstract "We demonstrate low-loss hydrogenated amorphous silicon (a-Si:H) waveguides by hot-wire chemical vapor deposition (HWCVD). The effect of hydrogenation in a-Si at different deposition temperatures has been investigated and analyzed by Raman spectroscopy. We obtained an optical quality a-Si:H waveguide deposited at 230°C that has a strong Raman peak shift at 480 cm−1, peak width (full width at half-maximum) of 68.9 cm−1, and bond angle deviation of 8.98°. Optical transmission measurement shows a low propagation loss of 0.8 dB/cm at the 1550 nm wavelength, which is the first, to our knowledge, report for a HWCVD a-Si:H waveguide." @default.
- W2912394440 created "2019-02-21" @default.
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- W2912394440 date "2019-01-30" @default.
- W2912394440 modified "2023-10-12" @default.
- W2912394440 title "Hot-wire chemical vapor deposition low-loss hydrogenated amorphous silicon waveguides for silicon photonic devices" @default.
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- W2912394440 doi "https://doi.org/10.1364/prj.7.000193" @default.
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