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- W2913204915 abstract "Yield learning and optimization are critical for advanced IC design and manufacturing. Recent advance in machine learning has brought a lot of new opportunities in improving the performance and efficiency of IC yield learning and optimization. This paper surveys some recent results of using various machine learning/deep learning techniques for such purpose, including performance modeling under uncertainty, lithography modeling with transfer/active learning, lithography hotspot detection, and IC mask optimization. The state-of-the-art methods are explained, and challenges/opportunities are discussed." @default.
- W2913204915 created "2019-02-21" @default.
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- W2913204915 date "2018-10-01" @default.
- W2913204915 modified "2023-10-16" @default.
- W2913204915 title "Machine Learning for Yield Learning and Optimization" @default.
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- W2913204915 doi "https://doi.org/10.1109/test.2018.8624733" @default.
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