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- W2914225467 abstract "Due to high carrier mobility and excellent air stability, emerging 2D semiconducting Bi2O2Se is attracting much attention as a potential channel candidate for the next-generation field effect transistor (FETs). Although the fabricated bilayer (BL) and few layers Bi2O2Se FETs exhibit a large current on/off ratio (>106) and a near-ideal subthreshold swing value (≈65 mV dec−1), the performance limit of ultrashort channel Bi2O2Se FET is obscure. Here the ballistic performance upper limit of the sub 10 nm BL Bi2O2Se metal-oxide-semiconductor FETs (MOSFETs) is simulated for the first time by using ab initio quantum transport simulations. The optimized BL Bi2O2Se n-type MOSFETs can fulfill the high performance device requirements on the on-state current, delay time, and power dissipation of the International Technology Roadmap for Semiconductors in 2028 until the gate length is scaled down to 5 nm. Therefore, Moore's law can be extended to 5 nm by taking BL Bi2O2Se as the channel." @default.
- W2914225467 created "2019-02-21" @default.
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- W2914225467 date "2019-02-04" @default.
- W2914225467 modified "2023-10-17" @default.
- W2914225467 title "Sub 10 nm Bilayer Bi <sub>2</sub> O <sub>2</sub> Se Transistors" @default.
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- W2914225467 doi "https://doi.org/10.1002/aelm.201800720" @default.
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