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• W2942725478 endingPage "858" @default.
• W2942725478 startingPage "849" @default.
• W2942725478 abstract "Abstract Silicon dioxide (SiO 2 ) has been the most important insulator in the highly-developed field of silicon (Si) technology. Accurate pitch and gate linewidth measurements for SiO 2 /Si systems (systems with a SiO 2 insulating layer and Si substrate) have become necessary. Studying one such system obviously presents different results from that of the widely researched Si/Si structure, because the edge profile of the secondary electron (SE) signal contains contributions from two materials. In this work, several scanning electron microscope (SEM) images and SE profiles of SiO 2 /Si pitch and trapezoidal line structures, using various geometric and experimental parameters, were simulated through the use of Monte Carlo (MC) methods. It was found that, in contrast to Si/Si systems, the height of the insulating layer cannot be ignored during the evaluation of pitch and linewidth. The thickness (i.e., height) factor does play an important role in the contrast of SEM imaging and the shape of the SE profile in these two-material systems. The mechanism of the influence of insulating layer thickness for imaging was studied in detail. In addition, the SiO 2 /Si pitch structure with a real rough surface was also studied. This work has significant implications for the study of various kinds of two-material systems and could help to optimize the pitch and gate linewidth measurements." @default.
• W2942725478 created "2019-05-09" @default.
• W2942725478 creator A5015143947 @default.
• W2942725478 date "2019-05-03" @default.
• W2942725478 modified "2023-09-25" @default.
• W2942725478 title "Monte Carlo Simulation on the CD-SEM Images of SiO₂/Si Systems" @default.
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• W2942725478 doi "https://doi.org/10.1017/s1431927619000552" @default.
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• W2942725478 hasPublicationYear "2019" @default.
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