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- W2944546615 abstract "We report on UV-laser photoresist-mask writing as a tool for fabricating integrated optical waveguides. We investigate feature width and roughness under different write settings and apply the technique to realize integrated Si 3 N 4 waveguides and devices. © 2019 The Author(s)" @default.
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- W2944546615 date "2019-05-05" @default.
- W2944546615 modified "2023-09-26" @default.
- W2944546615 title "UV Laser Resist-Mask Writing for Low-Cost Prototyping of Integrated Optical Devices" @default.
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- W2944546615 doi "https://doi.org/10.23919/cleo.2019.8750407" @default.
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