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- W2945789213 abstract "The influence of a polyethylene glycol (PEG) additive on the morphology of 10 μm diameter holes in a Si(001) substrate formed by metal-assisted chemical etching (MacEtch) was investigated. The addition of PEG to the etching solution suppressed deformation of the Au catalyst film, so that the verticality of the etched holes was significantly improved. There was a strong correlation between the deformation of the thin (10 nm) Au catalyst film and the bending of etched holes during the MacEtch process." @default.
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- W2945789213 date "2019-05-16" @default.
- W2945789213 modified "2023-10-17" @default.
- W2945789213 title "Effect of additives on preparation of vertical holes in Si substrate using metal-assisted chemical etching" @default.
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- W2945789213 doi "https://doi.org/10.7567/1347-4065/ab0ff5" @default.
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